Fast Diffusion of Water Molecules into Chemically Modified SiO_2 Films Formed by Chemical Vapor Deposition
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概要
- 論文の詳細を見る
- 2012-01-05
著者
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Ohnishi Osamu
Department Of Applied Chemistry Faculty Of Engineering Hiroshima University
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Kobayashi Kinya
Hitachi Research Laboratory Hitachi Ltd.
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Doi Toshiro
Department Of Mechanical Engineering Graduate School Kyushu University
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Kurokawa Syuhei
Department Of Intelligent Machinery And Systems Kyushu University
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Ohtake Atsushi
Hitachi Res. Lab. Hitachi Ltd.
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Doi Toshiro
Department Of Mechanical Engineering Graduate School Of Engineering Kyushu University
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Ohnishi Osamu
Department Of Mechanical Engineering Graduate School Of Engineering Kyushu University
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Kobayashi Kinya
Hitachi Res. Lab. Hitachi Ltd.
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Doi Toshiro
Department of Education, Saitama University, 255 Shimo-Okubo, Sakura-ku, Saitama 338-8570, Japan
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KUROKAWA Syuhei
Department of Mechanical Engineering, Graduate School of Engineering, Kyushu University
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OHTAKE Atsushi
Hitachi Ltd., Hitachi Research Lab.
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KOBAYASHI Kinya
Hitachi Ltd., Hitachi Research Lab.
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