Highly Manufacturable and Cost-effective Single Ta_xC / Hf_xZr_<(1-x)>O_2 Gate CMOS Bulk Platform for LP Applications at the 45nm Node and Beyond
スポンサーリンク
概要
- 論文の詳細を見る
- 2007-09-19
著者
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GOURAUD P.
STMicroelectronics
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MULLER M.
NXP Semiconductors
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RAFIK M.
STMicroelectronics
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CATHIGNOL A.
STMicroelectronics
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RIBES G.
STMicroelectronics
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POKRANT S.
NXP Semiconductors
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LAVIRON C.
CEA-LETI
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HOBBS C.
Freescale
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ZAUNER A.
NXP Semiconductors
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BARNOLA S.
CEA-LETI
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SALVETAT T.
CEA-LETI
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LHOSTIS S.
STMicroelectronics
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COUDERC S.
STMicroelectronics
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PERREAU P.
CEA-LETI
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TRIYOSO D.
Freescale Semiconductor Inc.
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RAYMOND M.
Freescale Semiconductor Inc.
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LUCKOWSKI E.
Freescale Semiconductor Inc.
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FLEURY D.
STMicroelectronics
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ROMANJEK K.
NXP Semiconductors
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JULLIAN S.
NXP Semiconductors
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MORIN P.
STMicroelectronics
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AMINPUR M.
Freescale
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ZOLL S.
STMicroelectronics
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GARNIER P.
NXP Semiconductors
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SALVETTI F.
NXP Semiconductors
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Triyoso D.
Silicon Technology Solutions
関連論文
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- Highly Manufacturable and Cost-effective Single Ta_xC / Hf_xZr_O_2 Gate CMOS Bulk Platform for LP Applications at the 45nm Node and Beyond
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