Spatial Fluctuation of Electrical properties in Hf-Silicate Film Observed with Scanning Capacitance Microscopy
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概要
- 論文の詳細を見る
- 2006-09-13
著者
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WATANABE H.
Osaka University
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NARA Y.
Selete
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Ogiso H.
National Institute Of Advanced Industrial Science And Technology (aist)
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NAITOU Y.
National Institute of Advanced Industrial Science and Technology (AIST)
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NAITOU Y.
AIST-NeRI
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ANDO A.
AIST-NeRI
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OGISO H.
AIST-Advanced Manufacturing Research Institute
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KAMIYAMA S.
Selete
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YASUTAKE K.
Osaka Univ.
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Kamiyama S.
Mirai-selete
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