The Valence Band Alignment at Ultra-Thin SiO_2/Si(100) Interfaces Determined by High-Resolution X-Ray Photoelectron Spectroscopy
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概要
- 論文の詳細を見る
- 1995-08-21
著者
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FUKUDA M.
Department of Physics, Osaka Univ.
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Nakagawa K.
Department Of Internal Medicine Osaka Prefectural Habikino Hospital
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HIROSE M.
Department of Electrical Engineering, Hiroshima University
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ALAY J.
Research Center for Integrated Systems, Hiroshima University
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Alay J.
Research Center For Integrated Systems Hiroshima University
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YOKOYAMA S.
Research Center for Integrated Systems, Hiroshima University
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Hirose M.
Department Of Electrical Engineering Hiroshima University
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Nakagawa K.
Department of Electronics & Computer Science, College of Science & Technology, Nihon University
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