A Novel Lithographic Method for Fabricating Three Dimensional Periodic Stacks
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概要
- 論文の詳細を見る
- 2000-08-28
著者
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Matsuura Takashi
Laboratory For Electronic Intelligent Systems Research Institute Of Electrical Communication Tohoku
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Matsuda Kazumi
Laboratory For Electronic Intelligent Systems Research Institute Of Electrical Communication Tohoku
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Murota Junichi
Laboratory For Microelectronics Research Institute Of Electrical Communication Tohoku University
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Murota Junichi
Laboratory For Electronic Intelligent Systems Research Institute Of Electrical Communication Tohoku
関連論文
- A Novel Lithographic Method for Fabricating Three Dimensional Periodic Stacks
- Ultrashallow Junction Formation Using Low-Temperature Selective Si_Ge_x Chemical Vapor Deposition
- Fabrication of a Si_Ge_x Channel Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET) Containing High Ge Fraction Layer by Low-Pressure Chemical Vapor Deposition
- Phosphorus Doping in Si1-x-yGexCy Epitaxial Growth by Low-Pressure Chemical Vapor Deposition Using a SiH4–GeH4–CH3SiH3–PH3–H2 Gas System
- Separation between Surface Adsorption and Reaction of NH_3 on Si (100) by Flash Heating
- Atomic-Layer Surface Reaction of SiH_4 on Ge(100) ( Quantum Dot Structures)
- Hardware Implementation of New Analog Memory for Neural Networks
- LSI Neural Chip of Pulse-Output Network with Programmable Synapse
- Low-Temperature Epitaxial Growth of Si/Si_Ge_x/Si Heterostructure by Chemical Vapor Deposition
- Atomically Controlled Processing for Group IV Semiconductors by Chemical Vapor Deposition