Atomistic Investigations of $\alpha$-Fe Thin Film Growth on Al (100)

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概要

• 論文の詳細を見る

• The interfacial feature and growth morphology of a Fe-Al metallic bilayer system were quantitatively investigated by molecular dynamics simulation. Fe atoms of 0.1 eV incident energy were deposited on an Al (001) substrate at 300 K. At the interface region, an intermetallic compound was formed and found to be of the B2 structure. However, the Fe/Al system showed different characteristics, such as a layer coverage function and a mixing length, in comparison with other ferromagnetic/nonferromagnetic metallic bilayer systems. The different intermixing behaviors were successfully explained in terms of cohesive energy and lattice matching.

• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2005-07-15

著者

• Chung Yong‐chae

  Hanyang Univ. Seoul Kor

• CHUNG Yong-Chae

  CPRC, Department of Ceramic Engineering, Hanyang University

• Chung Chan-yeup

  Cprc Department Of Ceramic Engineering Hanyang University

• Chung Chan-Yeup

  CPRC, Department of Ceramic Engineering, Hanyang University, Seoul 133-791, Korea

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