CHUNG Yong-Chae | CPRC, Department of Ceramic Engineering, Hanyang University
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概要
関連著者
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CHUNG Yong-Chae
CPRC, Department of Ceramic Engineering, Hanyang University
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KANG In-Yong
CPRC, Department of Ceramic Engineering, Hanyang University
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KIM Sang-Pil
CPRC, Department of Ceramic Engineering, Hanyang University
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AHN Jinho
Department of Materials Science and Engineering, Hanyang University
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Ahn Jinho
Department Of Materials Engineering Graduate School Of Advanced Materials And Chemical Engineering H
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Chung Y‐c
Cprc Department Of Ceramic Engineering Hanyang University
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Ahn J
Department Of Materials Science & Engineering Hanyang University
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LEE Kwang-Ryeol
Future Technology Research Division, Korea Institute of Science and Technology
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Chung Yong-Chae
CPRC, Department of Ceramic Engineering, Hanyang University, Seoul 133-791, Korea
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Kim Sang-Pil
CPRC, Department of Ceramic Engineering, Hanyang University, Seoul 133-791, Korea
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Ahn Jinho
Department of Material Science and Engineering, Hanyang University, 17 Haengdang-dong, Seongdong-gu, Seoul 133-791, Korea
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Kim Chiho
CPRC, Department of Ceramic Engineering, Hanyang University, Seoul 133-791, Korea
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AHN Jinho
Department of Computer Science, Kyonggi University
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Kim Tae
Department Of Materials Science And Engineering Korea Advanced Institute Of Science And Technology
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LEE Seung
Department of Dermatology and Human Barrier Research Institute, Yonsei University College of Medicin
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Lee Seung
Hanyang University
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OH Hye-Keun
Physics Department, Hanyang University
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Chung Yong‐chae
Hanyang Univ. Seoul Kor
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Lee Seung-cheol
Future Technology Research Division Korea Institute Of Science And Technology
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Chung Chan-yeup
Cprc Department Of Ceramic Engineering Hanyang University
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Oh Hye-keun
Physics Department Hanyang University
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Kim Tae
Department Of Anesthesia And Pain Medicine School Of Medicine Pusan National University
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KIM Hanchul
Materials Evaluation Center, Korea Research Institute of Standards and Science
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Lee Seung
Department Of Anesthesiology And Pain Medicine Dong-a University Hospital
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Lee Seung-cheol
Future Fusion Technology Laboratory Korea Institute Of Science & Technology
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Chung Chan-Yeup
CPRC, Department of Ceramic Engineering, Hanyang University, Seoul 133-791, Korea
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Kang In-Yong
CPRC, Department of Ceramic Engineering, Hanyang University, Seoul 133-791, Korea
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Oh Hye-Keun
Physics Department, Hanyang University, Ansan 426-791, Korea
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Kim Yoon-Suk
CPRC, Department of Ceramic Engineering, Hanyang University, Seoul 133-791, Korea
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Ahn Jinho
Department of Materials Science & Engineering, Hanyang University, Seoul 133-791, Korea
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Kim Hanchul
Materials Evaluation Center, Korea Research Institute of Standards and Science, Daejeon 305-600, Korea
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Lee Seung
Department of Materials Science & Engineering, Hanyang University, Seoul 133-791, Korea
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Lee Seung-Cheol
Future Technology Research Division, Korea Institute of Science and Technology, Seoul 130-650, Korea
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Kim Tae
Department of Materials Science & Engineering, Hanyang University, Seoul 133-791, Korea
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Lee Kwang-Ryeol
Future Technology Research Division, Korea Institute of Science and Technology, Seoul 130-650, Korea
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Kim Hanchul
CPRC, Department of Ceramic Engineering, Hanyang University, Seoul 133-791, Korea
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Kim Tae
Department of Advanced Materials Engineering, Sungkyunkwan University, Suwon, Gyeonggi 440-746, Republic Korea
著作論文
- Structural Characterization of a Mo/Ru/Si Extreme Ultraviolet (EUV) Reflector by Optical Modeling
- Numerical Investigation of Defect Printability in Extreme Ultraviolet (EUV) Reflector : Ru/Mo/Si Multilayer System
- Molecular Dynamics Simulation at the Early Stage of Thin-Film Deposition : Al or Co on Co(111)
- Atomistic Investigations of $\alpha$-Fe Thin Film Growth on Al (100)
- Ab initio Investigation of the Early Stage of Nano-scale Thin Film Growth: Al and Co Adatoms on Co (111) Surface
- Molecular Dynamics Simulation at the Early Stage of Thin-Film Deposition: Al or Co on Co(111)
- Structural Characterization of a Mo/Ru/Si Extreme Ultraviolet (EUV) Reflector by Optical Modeling
- Numerical Investigation of Defect Printability in Extreme Ultraviolet (EUV) Reflector: Ru/Mo/Si Multilayer System
- Electronic Structure and Magnetic Property of Mn-Incorporated $\beta$-SiC(100)
- Optimization of Low-Energy Electron Beam Proximity Lithography Stencil Mask Structure Factors by Monte Carlo Simulation