Effects of Line Resistance and Parasitic Capacitance on Transmittance Distribution in TFT-LCDs
スポンサーリンク
概要
- 論文の詳細を見る
- 1992-01-25
著者
-
Ono Kikuo
Hitachi Research Laboratory Hitachi Ltd.
-
Ono Kikuo
Hitachi Research Laboratory
-
KONISHI Nobutake
Hitachi Research Laboratory, Hitachi Ltd.
-
TANAKA Takeshi
Hitachi Research Laboratory
-
OHIDA Jun
Mobara Works, Hitachi
-
OHWADA Junichi
Mobara Works, Hitachi
-
Konishi N
Hitachi Research Laboratory
-
Konishi Nobutake
Hitachi Research Laboratory Hitachi Ltd.
-
Ohida Jun
Mobara Works Hitachi
-
Ohwada Junichi
Mobara Works Hitachi
-
Ono Kikuo
Hitachi Displays, Ltd., Mobara, Chiba 297-0037, Japan
-
KONISHI Nobutake
Hitachi Research Laboratory
関連論文
- A Light Activated High Power Bidirectional Thyristor : B-5: SENSING DEVICES
- A 24 cm Diagonal TFT-LCD Fabricated Using a Simplified, Four-Photolithographic Mask Process (Special Issue on Liquid-Crystal Displays)
- Application of Ion Doping and Excimer Laser Annealing to Fabrication of Low-Temperature Polycrystalline Si Thin-Film Transistors
- Effects of Line Resistance and Parasitic Capacitance on Transmittance Distribution in TFT-LCDs
- Effect of Channel Implantation on the Device Performance of Low Temperature Processed Polycrystalline Silicon Thin Film Transistors
- Correlation of Light Scattering of Homogenous Alignment Liquid Crystal Layers with Material Properties of Liquid Crystals
- Light Leakage Behaviors of Homogenously Aligned Liquid Crystal Layers Placed between Crossed Polarizers
- Interaction of Hydrogenated Silicon Nitride Films with Indium Tin Oxide
- Large-Area Doping Process for Fabrication of poly-Si Thin Film Transistors Using Bucket Ion Source and XeCl Excimer Laser Annealing
- TEM Observations of Initial Crystallization States for LPCVD Si Films : Condensed Matter
- Quantitative Analysis Method for Measuring Light Leakage Intensity of Three Primary Color Filters Placed between Crossed Polarizers
- P-12 Simple measuring method of VO_2max with a wristband-type accelerometer(The Proceedings of the 21st Annual Meetings of Japan Society of Exercise and Sports Physiology July 27 ・ 28, (Saitama))