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Ulvac Japan Ltd | 論文
- Electron Temperature and Density Profiles in a Neutral Loop Discharge Plasma
- Usefulness of Magnetic Neutral Loop Discharge Plasma in Plasma Processing
- Dry Etch Process in Magnetic Neutral Loop Discharge Plasma
- Observation of Induction Power Dependence on the Magnetic Neutral Loop Discharge Plasma Thermalization Phenomena
- Measurements of Parameters of Two-Electron-Temperature Plasma Produced by Electron Cyclotron Resonance
- Application of Radio-Frequency Discharged Plasma Produced in Closed Magnetic Neutral Line for Plasma Processing
- Plasma Production Using Energetic Meandering Electrons
- Collisionless Heating of Electrons by Meandering Chaos and Its Application to a Low-Pressure Plasma Source