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Tokyo Electron Yamanashi Ltd. | 論文
- Mass Spectrometry of Discharge Products at 13.56 MHz in SF_6 Gas ( Plasma Processing)
- Positive Ions in RF Discharge Plasmas of C_4F_8/Ar and C_4F_8/O_2 Mixtures
- Positive Ions in C_4F_8 RF Discharge in a Planar Diode
- Characteristics of Parallel-Plate RF Discharges in C_4F_8 Gas and C_4F_8/O_2 Mixtures
- Ionic Species in 13.56 MHz Discharges in CF_4 Gas and Mixtures of It with Ar and O_2
- Positive and Negative Ions in RF Plasmas of SF_6/N_2 and SF_6/Ar Mixtures in a Planar Diode
- Positive Ions in RF Discharge Plasma of CF_4 Gas in a Planar Diode
- Negative Ions in 13.56 MHz Discharge of SF_6 Gas in a Planar Diode
- Mass Spectrometrie Observation of Decomposition Products SF_x (x=1,2) in SF_6 Discharge at 13.56 MHz
- Description of Upper Triassic Kyushutrigonia hachibarensis, New Genus and New Species with Revision of Trigonian Species from Sambosan Terrane, Japan
- Investigation of Etch Rate Uniformity of 60 MHz Plasma Etching Equipment : Nuclear Science, Plasmas, and Electric Discharges
- Ionic Species in 13.56 MHz Discharges in CF 4 Gas and Mixtures of It with Ar and O 2