Investigation of Etch Rate Uniformity of 60 MHz Plasma Etching Equipment : Nuclear Science, Plasmas, and Electric Discharges

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Compositional Dependence of Electrical Properties of Highly (100)-/(001)-Oriented Pb(Zr,Ti)O_3 Thick Films Prepared on Si Substrates by Metalorganic Chemical Vapor Deposition
Structural and Electrical Properties of Polycrystalline Bi_Nd_xTi_3O_ Ferroelectric Thin Films with in-Plane c-Axis Orientations
Charge-Compensative Ion Substitution of La^-Substituted Bismuth Titanate Thin Films for Enhancement of Remanent Polarization
Electrical Properties of (Ca,Sr)Bi_4Ti_40_ Thin Films Fabricated Using a Chemical Solution Deposition Method
Synthesis and Electrical Properties of Sr-and Nb-Cosubstituted Bi_Sr_xTi_NbO_ Polycrystalline Thin Films
Fabrication of M^-Substituted and M^/V^-Cosubstituted Bismuth Titanate Thin Films [M = lanthanoid] by Chemical Solution Deposition Technique
Ferroelectric Properties of Al-doped Lead Titanate Zirconate Thin Films Prepared by Chemical Solution Deposition Process
Preparation of Sputter-deposited Fe-Pd Thin Films
Measurement of Magnetic Field using Ultrasonic Vibration
Preparation of Lead Zirconate Titanate Thick Films by Arc-Discharged Reactive Ion-Plating Method
Effect of Pb_(Al_Nb_)O_3 on Structure and Electrical Properties of Lead Titanate Thin Films Prepared by Chemical Solution Deposition Process(Electrical Properties of Condensed Matter)
Electrical and Physical Properties of Lead Aluminum Niobate-Lead Titanate Ferroelectric Thin Films Prepared by Chemical Solution Deposition Process : Electrical Properties of Condensed Matter
Crystallization Process of TiNi Thin Films Sputtered at Elevated Temperatures on Pt/Si Oxide/Si and Si Oxide/Si Substrates
Improvement in etch rate uniformity using resistive electrodes with multistep cavity
Piezoelectric Properties of Polar-Axis-Oriented Ferroelectric Bi_Pr_xTi_3O_ Thick Films
Ferroelectric and Piezoelectric Properties of Disk Shape Lead Zirconate Titanate Thick Films
Orientation Behavior and Ferro- and Piezoelectric Properties of Bi_Pr_xTi_3O_ Polycrystalline Films
Evaluation of Longitudinal Displacement for Lead Zirconate Titanate Films
Investigation of Etch Rate Uniformity of 60 MHz Plasma Etching Equipment : Nuclear Science, Plasmas, and Electric Discharges
Improvement in Etch Rate Uniformity Using Resistive Electrodes with Multistep Cavity
Measurement of Magnetic Field using Ultrasonic Vibration

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