Crystallization Process of TiNi Thin Films Sputtered at Elevated Temperatures on Pt/Si Oxide/Si and Si Oxide/Si Substrates
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2000-02-15
著者
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Iijima Takashi
Materials Engineering Division Tohoku National Industrial Research Institute
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ABE Toshihiko
Materials Engineering Division, Tohoku National Industrial Research Institute, AIST, MITI
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Nanjo Hiroshi
Second Department Of Pathology Akita University School Of Medicine
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Nanjo Hiroshi
Isem National Institute Of Advanced Industrial Science And Technology (aist)
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Nanjo H
Isem National Institute Of Advanced Industrial Science And Technology (aist)
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KIM Ick-Jun
Material Engineering Division, Tohoku National Industrial Research Institute
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NANJO Hiroshi
Material Engineering Division, Tohoku National Industrial Research Institute
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Nanjo Hiroshi
Material Engineering Division Tohoku National Industrial Research Institute
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Kim Ick-jun
Material Engineering Division Tohoku National Industrial Research Institute
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Abe Toshihiko
Material Engineering Division Tohoku National Industrial Research Institute
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Iijima Takashi
Material Engineering Division Tohoku National Industrial Research Institute
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