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Semiconductor Research Division Hyundai Electronics Industries Co. Ltd. | 論文
- Optical Proximity Correction Using Diffused Aerial Image Model
- Optical Proximity Correction Using Diffused Aerial Image Model
- Optical Proximity Correction Using Diffused Aerial Image Model
- 光近接補正にたいする超薄膜レジストの近似モデル
- TiN Etching and Its Effects on Tungsten Etching in SF_6/Ar Helicon Plasma
- Effect of Additive Gases on Dimension Control during Cl_2-Based Polysilicon Gate Etching
- Coercive Voltage Shift of a Ferroelectric Capacitor during Interconnect Metal Etch
- Coercive Voltage Shift of a Ferroelectric Capacitor during Interconnect Metal Etch
- Coercive Voltage Shift of a Ferroelectric Capacitor during Interconnect Metal Etch
- Effects of buried oxide stress on thin-film silicon-on-insulator metal-oxide-semiconductor field-effect-transistor
- BC(Body-Contacted) SOI-CMOS Technology and Its Application to High Density Memory
- Effects of buried oxide stress on thin-film silicon-on-insulator metal-oxide-semiconductor field-effect-transistor
- EVALUATION OF SOI WAFERS USING C-V CHARACTERISTICS OF THIN-FILM MOS CAPACTOR
- EVALUATION OF SOI WAFERS USING C-V CHARACTERISTICS OF THIN-FILM MOS CAPACTOR
- Negative Ion Formation in SiO_2 Etching Using a Pulsed Inductively Coupled Plasma