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Samsung Electronic Co. Ltd. Kyunggi‐do Kor | 論文
- Flare in Microlithographic Exposure Tools
- Plasma-Assisted Dry Etching of Ferroelectric Capacitor Modules and Application to a 32M Ferroelectric Random Access Memory Devices with Submicron Feature Sizes
- Integration of Ferroelectric Random Access Memory Devices with Ir/IrO_2/Pb(Zr_xTi_)O^^_3/Ir Capacitors Formed by Metalorganic Chemical Vapor Deposition-Grown Pb(Zr_xTi_)O_3
- Enhanced Retention Characteristics of Pb(Zr, Ti)O_3 Capacitors by Ozone Treatment : Electrical Properties of Condensed Matter
- Cyclopropyl-containing Photoacid Generators for Chemically Amplified Resists
- X-Ray Photoelectron Spectroscopy Study of Pt-Oxide Thin Films Deposited by Reactive Sputtering Using O_2/Ar Gas Mixtures
- Effects of SF_6 Addition to O_2 Plasma on Polyimide Etching
- Etching Characteristics of Fine Ta Patterns with Electron Cyclotron Resonance Chlorine Plasma
- Epitaxial Growth of GaN by Helicon Wave Plasma Assisted Metal Organic Chemical Vapor Deposition Process
- Spectral Properties of Nd^_-Doped RO・Na_2O・Al_2O_3・P_2O_5 (R=Mg, Ca, Ba) Glass System