X-Ray Photoelectron Spectroscopy Study of Pt-Oxide Thin Films Deposited by Reactive Sputtering Using O_2/Ar Gas Mixtures
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1999-08-15
著者
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Jo William
Devices And Materials Laboratory Lg Corporate Institute Of Technology
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Kim H‐d
Samsung Electronic Co. Ltd. Kyunggi‐do Kor
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Jung Min-Cherl
Department of Physics, University of Seoul
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Kim Hyeong-Do
Department of Phyics, University of Seoul
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Han Moonsup
Department of Physics, University of Seoul
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Kim Chun
Devices and Materials Laboratory, LG Corporate Institute of Technology
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Han Moonsup
Department Of Physics University Of Seoul
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Jung Min-cherl
Department Of Physics University Of Seoul
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Jung M‐c
Univ. Seoul Seoul Kor
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Kim Chun
Devices And Materials Laboratory Lg Corporate Institute Of Technology
関連論文
- X-Ray Photoelectron Spectroscopy Study of Pt-Oxide Thin Films Deposited by Reactive Sputtering Using O_2/Ar Gas Mixtures
- Chemical and Structural Stabilities of SiN_x Nano-Scale Islands Formed by Ionized N_2 Gas at Room Temperature
- Photoluminescence and Electroluminescence Properties of The Er-doped Silicon-Rich Silicon Oxide Films deposited by Pulsed Laser Deposition Technique
- Chemical and Structural Stabilities of SiNx Nano-Scale Islands Formed by Ionized N2 Gas at Room Temperature