スポンサーリンク
Samco International Inc. | 論文
- Materials Characterization of Plasma Deposited Copolymer Using CFC-113 With C_2H_4 Monomer
- In situ Observation of Etching Profile in Inductively Coupled Plasma Etching of GaAs and InP using Long Distance Microscope
- Large-Area Deposition of Tin Oxide Film by Photochemical Vapour Deposition (第38回真空に関する連合講演会プロシ-ディングス(1997年11月5日〜7日,東京))
- Improvement in Homogeneity and Ferroelectric Property on Mist Deposition Derived Pb(Zr, Ti)O_3 Thin Films by Substrate Surface Treatment
- Solid Source Dry Etching Process for GaAs and InP
- Iodine Solid Source Inductively Coupled Plasma Etching of InP
- Vertical and Smooth Microfabrication of InP Using Simple High-Density Plasma System with SmCo Ring Magnet
- Low-Temperature Dry Etching of InP by Inductively Coupled Plasma Using HI/Cl_2
- Cl_2-based Inductively Coupled Plasma Etching of InP Using Internal Antenna
- Measurement of Plasma Density for Control of Etching Profile in Inductively Coupled Plasma Etching of InP
- Mass Effect of Etching Gases in Vertical and Smooth Dry Etching of InP
- Emission Spectrochemical Analysis in Dry Etching Process of InP by Cl_2 Inductively Coupled Plasma
- Plasma Diagnostics in Inductively Coupled Plasma Etching Using Cl_2/Xe
- Vertical and Smooth Etching of InP by Cl_2/Xe Inductively Coupled Plasma
- Characteristics of Ultrathin Ferroelectric Liquid Crystal Film and Optical Switching
- Electrooptic Behavior of Free-Standing Ferroelectric Liquid Crystal Film
- Optimization of Amorphous Carbon-Deposited Antireflective Layer for Advanced Lithography
- New Plasma Surface Treatment for Wire Bonding Process : Effect of Sublimation with Alkyl Group Radicals
- Vertical and Smooth Microfabrication of InP Using Simple High-Density Plasma System with SmCo Ring Magnet
- A New Plasma Process for Surface Treatment prior to Wire Bonding that Utilizes the Sublimation Effect of Alkyl Group Radicals