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Process Equipment Engineering Div., Canon Sales Co., Inc. | 論文
- Ashing Properties in a Surface-Wave Mode Plasma with a Quartz Window
- Surface Wave Plasma Production Employing High Permittivity Material for Microwave Window : Nuclear Science, Plasmas, and Electric Discharges
- Ashing Properties in a Surface-Wave Mode Plasma with a High-Permittivity Alumina Window : Semiconductors
- Oxygen Microwave Plasma Density Enhancement by Surface Waves with a High-Permittivity Material Window
- Effects of Nitrogen Addition to Microwave Oxygen Plasma in Surface Wave with Disk-Plate Window and Photoresist Ashing
- A Model for Resolution Dependent Roughness Values Measured by an Optical Profiler for Specific Surfaces
- Comparison of Deposition Characteristics between Triethyl and Trimethyl Borates in an Atmospheric Pressure Chemical Vapor Deposition Equipment with Tetraethyl Orthosilicate and O_3
- A Generalized Model for Resolution-Dependent Roughness Measured by an Optical Profiler for Optical Surfaces
- Band-Gap Energy and Effecive Mass of BGaN
- Dependence of Crystal Quality on Residual Strain in Strain-Controlled Thin AlN Layer Grown by Metalorganic Vapor Phase Epitaxy
- Atomic Layer Controlled Digital Etching of Silicon : Etching and Deposition Technology
- Atomic Layer Controlled Digital Etching of Silicon
- Anomalous Hydrodynamic Behavior of Smectic Liquid Crystals at Low Frequencies
- Apparatus for Measurement of Complex Shear Modulus of Liquid Crystals at Low Frequencies : Physical Acoustics