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Precision Equipment Company Nikon Corporation | 論文
- Fabrication of 0.1μm Line-and-Space Patterns using Soft X-Ray Reduction Lithography
- Improvement of the Uniformity of Tungsten / Carborn Multilayers by Thermal Processing
- Normal-Incidence X-Ray Microscope for Carbon Kα Radiation with 0.5 μm Resolution
- Ring-Field Extreme Ultraviolet Exposure System Using Aspherical Mirrors
- Structural Properties of Li_xMn_2O_4 as Investigated by Molecular Dynamics and Density Functional Theory
- Chemical Approach Using Tailored Liquid Sources for Traditional and Novel Ferroelectric Thin Films
- Local Piezoelectric Response in Bismuth-Based Ferroelectric Thin Films Investigated by Scanning Force Microscopy : Electnical Properties of Condensed Malter
- Structure and Ferroelectric Properties of Alkoxy-Derived Ca_2Bi_4Ti_5O_ Thin Films on Pt(111)/TiO_x/SiO_2/Si(100)
- Investigation of Domain Switching and Retention in Oriented PbZr_Ti_O_3 Thin Film by Scanning Force Microscopy
- Atomistic Crystal Growth Process of Metal Oxide Electronics Materials : Theoretical Simulation Studies
- Molecular Dynamics Simulations of Adhesional Forces via Hydrocarbon Films
- Write Power Optimizing Method for Multi-Pulse Recording on Magneto-Optical Disk
- Comparison of Microstructure and Ferroelectric Properties of Alkoxy-Derived MBi_4Ti_4O_ (M: Ca or Sr) Thin Films
- Preparation of Layer-Structured CaBi_2Ta_2O_9 Ferroelectric Thin Films through a Triple Alkoxide Route
- Progress and Preliminary Results on EB Stepper : Review Paper
- Nonlinear behavior of decrease in reflectivity of multilayer mirrors for extreme ultraviolet lithography optics by high-flux extreme ultraviolet irradiation in various vacuum environments (Special issue: Microprocesses and nanotechnology)
- Semi-epitaxial bcc Ta Growth on Metal Nitride(Surfaces, Interfaces, and Films)
- Improvement of flare modeling and derivation for extreme ultraviolet optics (Special issue: Microprocesses and nanotechnology)
- Low-Stress Molybdenum/Silicon Multilayer Coatings for Extreme Ultraviolet Lithography
- Magneto-Optical Disk Drive Robust Servo System with Model Reference Adaptive Control