Improvement of flare modeling and derivation for extreme ultraviolet optics (Special issue: Microprocesses and nanotechnology)

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文

著者

• Shiraishi Masayuki

  Precision Equipment Company Nikon Corporation

• Oshino Tetsuya

  Precision Equipment Company Nikon Corporation

関連論文

• Fabrication of 0.1μm Line-and-Space Patterns using Soft X-Ray Reduction Lithography
• Improvement of the Uniformity of Tungsten / Carborn Multilayers by Thermal Processing
• Normal-Incidence X-Ray Microscope for Carbon Kα Radiation with 0.5 μm Resolution
• Ring-Field Extreme Ultraviolet Exposure System Using Aspherical Mirrors
• Improvement of flare modeling and derivation for extreme ultraviolet optics (Special issue: Microprocesses and nanotechnology)
• Low-Stress Molybdenum/Silicon Multilayer Coatings for Extreme Ultraviolet Lithography

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