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National Inst. Advanced Industrial Sci. And Technol. Ibaraki Jpn | 論文
- Si_Ge_xチャネルpMOSFETにおける低周波雑音とSi_Ge_x/ヘテロ構造品質との対応
- Si_Ge_xチャネルpMOSFETにおける低周波雑音とSi_Ge_x/ヘテロ構造品質との対応
- Fabrication of a Vertical-Channel Double-Gate Metal-Oxide-Semiconductor Field-Effect Transistor Using a Neutral Beam Etching
- Isolation and Characterization of a cDNA Encoding Phytochrome A in the Non-Photosynthetic Parasitic Plant, Orobanche minor Sm
- シリコン量子井戸構造の作製と評価
- シリコン量子井戸構造の作製と評価
- Switching Dynamics of Bi_2Sr_2CaCu_2O_ Intrinsic Josephson Junctions : Macroscopic Quantum Tunneling and Self-Heating Effect(Condensed matter: electronic structure and electrical, magnetic, and optical properties)
- Low-Leakage-Current Ultra-thin SiO_2 Film by Low-Temperature Neutral Beam Oxidation
- Thermal Variations of Magnetic Excitation Spectrum in Slightly Overdoped Bi_Sr_CaCu_2O_
- Regulated Epitaxy of YBa_2Cu_3O_ by Atomic Control of Step Arrays on Vicinal SrTio_3(100) Substrates
- Control of Step Arrays on Normal and Vicinal SrTiO_3 (100) Substrates
- Experimental Studies of Triangular Lattice Antiferromagnets with S=1/2:NaTiO_2 and LiNiO_2
- 低温多結晶シリコンTFTのデバイス特性や信頼性に及ぼす粒界の影響(有機EL, TFT,及び一般)
- 低温多結晶シリコンTFTのデバイス特性や信頼性に及ぼす粒界の影響(有機EL, TFT,及び一般)
- 低温多結晶シリコンTFTのデバイス特性や信頼性に及ぼす粒界の影響(有機EL, TFT,及び一般)
- SOI CMOSデバイス
- Deoxidization of Cu Oxide under Extremely Low Oxygen Pressure Ambient
- Quasi-One-Dimensional Antiferromagnetic Correlation in the Kondo Semiconductor CeNiSn
- Dichromated Gelatine as a Material of Optical Element
- Improvement of DC Characteristics in AlGaN/GaN Heterojunction Field-Effect Transistors Employing AlN Spacer Layer