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Mitsubishi Materials Corp. Saitama Jpn | 論文
- Simulation of Light Scattering by a Particle on a Film-Coated Substrate Using Coupled-Dipole Method
- Light Scattering by Submicron Particles on Film-Coated Wafers
- Adsorption and Desorption of Metallic Impurities on Si Wafer Surface in SC1 Solution
- Effect of Crystal Pulling Rate on Formation of Crystal-Originated "Particles" on Si Wafers
- Crystal-Originated Singularities on Si Wafer Surface after SCl Cleaning
- A Study of Defect Formation Mechamism at Edges of Local Oxidation of Silicon Structure
- Metal Impurity Trapping Effect by Stress at Edges of Local Oxidation of Silicon Structure
- Stress-Enhanced Diffusion of Boron at the Interface of a Directly Bonded Silicon Wafer
- Photorefractive Response Characteristics and Generation of Phase-Conjugate Wave in Bi_GeO_ and Bi_SiO_ Crystals
- Enhancement of Optical Wave Mixing Characteristics of Photorefractive Bi_Si_ Crystal by Moving Grating Method
- Time-Dependent Variation of Composition of SC1 Solution
- Quantitative Analysis of Surface Contaminations on Si Wafers by Total Reflection X-Ray Fluorescence
- Tuning of a Surface Acoustic Wave Resonator Formed of Lithium Tetraborate Substrate Combined with Piezoelectric Ceramic Element
- Measurement of Organic Matter on Si Wafer by Thermal Desorption Spectroscopy
- Growth of Native Oxide and Accumulation of Organic Matter on Bare Si Wafer in Air
- Study of Si Etch Rate in Various Composition of SC1 Solution