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Meijo Univ. Nagoya Jpn | 論文
- Post-Translational Modification of βH-Crystallin of Bovine Lens with Aging (Medicina Chemistry)
- Lack of Action Potential-Prolonging Effect of Terfenadine on Rabbit Myocardial Tissue Preparations(Pharmacology)
- P2-4 分極反転層を形成したLiNbO_3トランスデューサの固体媒質への超音波放射特性(ポスターセッション2(概要講演))
- 分極反転層を形成したLiNbO_3トランスデューサの固体媒質への超音波放射特性
- 分極反転層を有するLiNbO_3板を用いた広帯域超音波トランスデューサ
- ハーモニックメージング用LiNbO_3トランスデューサ
- 励振電界を傾斜化した複合圧電材料とその無回折ビームトランスデューサへの応用
- Nitrogen Doping into Cu_2O Thin Films Deposited by Reactive Radio-Frequency Magnetron Sputtering
- Nitrogen Doping into Cu_2O Thin Films Deposited by Reactive Sputtering Method
- Thin-Film Deposition of Cu_2O by Reactive Radio-Frequency Magnetron Sputtering
- Effect of Electron Shading on Gate Oxide Degradation
- Reduction of Charge Build-Up with Pulse-Modulated Bias in Pulsed Electron Cyclotron Resonance Plasma
- Influence of Puled Electron Cyclotron Resonance Plasma on Gate Electrode Etching
- Reduction of Charge Build-up with High-Power Pulsed Electron Cyclotron Resonance Plasma
- Evaluation of Electron Shading Charge Buildup Damage Using Metal-Nitride-Oxide-Silicon Capacitors
- Etching Characteristics of WSi_2 with Pulsed-Electron Cyclotron Resonance Plasma
- Precise Evaluation of Pattern Distortion with Variation of the Impurity Concentration and Conductivity of Silicon Films
- SiO_2 Etching in C_4F_8/O_2 Electron Cyclotron Resonance Plasma
- Analysis of Fluorocarbon Deposition during SiO_2 Etching
- Pulsed Plasma Processing for Reduction of Profile Distortion Induced by Charge Buildup in Electron Cyclotron Resonance Plasma