スポンサーリンク
Instrument Division, Hitachi, Ltd. | 論文
- Stitching Error Analysis in an Electron Beam Lithography System: Column Vibration Effect
- The Requirements for Future Elcetron-Beam Reticle Fabrication Systems from an Error Analysis Viewpoint
- Error Analysis in Electron Beam Lithography System : Thermal Effects on Positioning Accuracy
- Analysis of Eddy Current Effects in an Electron Optical Column
- Cell Projection Lithography with Scattering Contrast
- Improved Alignment Accuracy Using Lens-Distortion Correction for Electron-Beam Lithography in Mix-and-Match with an Optical Stepper
- High Speed Electron Beam Cell Projection Exposure System (Special Issue on Quarter Micron Si Device and Process Technologies)
- High-Resolution Wafer Inspection Using the "in-lens SEM" (Special Issue on Scientific ULSI Manufacturing Technology)
- Precise Linewidth Measurement Using a Scanning Electron Probe (Special Issue on Sub-Half Micron Si Device and Process Technologies)
- Evaluation of Pupil-Filtering in High-Numerical Aperture I-Line Lens
- Finding All Solutions of Piecewise-Linear Resistive Circuits Containing Nonseparable Transistor Models
- Computer Simulation of Charged Particle Beam Trajectories in a Quadrupole Ion Trap Mass Spectrometer
- Calculation of Local Temperature Rise in Focused-Ion-Beam Sample Preparation
- The C-13 NMR spectra of thiophenes. II. 2-Substituted thiophenes.