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Functional Materials Research Laboratories, NEC Corporation | 論文
- Low Temperature Recovery of Ru(Ba, Sr)TiO_3/Ru Capacitors Degraded by Forming Gas Annealing
- Electrical Properties of (Ba,Sr)TiO_3 Films on Ru Bottom Electrodes Prepared by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition at Extremely Low Temperature and Rapid Thermal Annealing
- Electrical Properties of (Ba,Sr)TiO_3 Films on Ru Bottom Electrodes Prepared by ECR Plasma CVD at Extremely Low Temperature and RTA
- Low Temperature Deposition of (Ba, Sr)TiO_3 Films by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition
- ArF Chemically Amplffied Positive Resist Based on Alicyclic Lactone Polymer : Instrumentation, Measurement, and Fabrication Technology
- Development of Transparent Alkylsulfonium Salt as a Photoacid Generator for ArF Excimer Laser Lithography(Special Issue on Organic Materials for Optics and Electronics)
- Chemically Amplified Negative Resists Based on Alicyclic Acrylate Polymers for 193-nm Lithography
- Study of Submicron SrTiO_3 Patterning
- Synthesis and Electrochemical Characterization of a Polyradical Cathode Material for Rechargeable Batteries(Special Issue on Recent Progress in Organic Molecular Electronics)
- SrTiO_3 Thin Film Preparation by Ion Beam Sputtering and Its Dielectric Properties : Thin Films
- A High Capacitive Coupling Ratio (HiCR) Cell for Single 3 Volt Power Supply Flash Memories (Special Section on High Speed and High Density Multi Functional LSI Memories)
- ArF Chemically Amplified Positive Resist Based on Alicyclic Lactone Polymer