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Department of Quantum Engineering, Nagoya University | 論文
- Influence of Impurity-Scattering on Tunneling Conductance in d-Wave Superconductors with Broken Time Reversal Symmetry
- Influence of the Impurity-scattering on Zero-bias Conductance Peak in Ferromagnet/Insulator/d-wave Superconductor Junctions
- Electrophysiological and Biochemical Effects of Exposure to 2, 5-Hexanedione on Peripheral Nerve in Experimental Diabetic Rats
- Proposal of a Desk-Side Supercomputer with Reconfigurable Data-Paths Using Rapid Single-Flux-Quantum Circuits
- 100GHz Demonstrations Based on the Single-Flux-Quantum Cell Library for the 10kA/cm^2 Nb Multi-Layer Process
- A questionnaire survey of hand dermatitis among Japanese nursing students
- Hand Dermatitis and Musculoskeletal Disorders among Female Nursing Students in Japan
- Fabrication of Multilayered SiOCH Films with Low Dielectric Constant Employing Layer-by-Layer Process of Plasma Enhanced Chemical Vapor Deposition and Oxidation
- Effects of Oxygen and Nitrogen Atoms on SiOCH Film Etching in Ultrahigh-Frequency Plasma
- Plasma Induced Subsurface Reactions for Anisotropic Etching of Organic Low Dielectric Film Employing N_2 and H_2 Gas Chemistry
- Synthesis of Polytetrafluoroethylene-like Films by a Novel Plasma Enhanced Chemical Vapor Deposition Employing Solid Material Evaporation Technique
- Tunneling Conductance in Normal Metal-High-T_c Cuprate Junctions in the Presence of Magnetic Field
- Effect of Ultrasonic Irradiation Parameters on the Supercooling Relaxation Behavior of PCM
- Characteristics of Interface-Modified Josephson Junctions Fabricated under Various Etching Conditions
- Interface-Treated Josephson Junctions in Trilayer Structures
- Enhancement-Mode n-Channel GaN MOSFETs Using HfO_2 as a Gate Oxide
- CH_3 Radical Density in Electron Cyclotron Resonance CH_3OH and CH_3OH/H_2 Plasmas
- Planarization of the Yba_2Cu_3O_ Base Electrodes in Trilayer Josephson Junctions : Superconductors
- CW Laser-Induced Fluorescence Study of SiH_2+ SiH_4 Reaction : Dominance of Two-Body Reaction Channel in Low-Pressure Silane Plasma
- Translational Temperature Measurement for SiH_2 in RF Silane Plasma Using CW Laser Induced Fluorescence Spectroscopy