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Department of Materials Science, Kitami Institute of Technology | 論文
- Surface Oxidation Behavior of TiN Film Caused by Depositing SrTiO_3 Film
- Oriented Growth of Cu(110) on YSi_(1100)/Si(100) and Diffusion Behavior in Copper Silicide Formation
- Auger Electron Spectroscopy Study on the Stability of the Interface between Deposited Cu_9Al_4 Intermetallic Compound Film and Si
- Influence of Sputtering Parameters on the Formation Process of High-Quality and Low-Resistivity HfN Thin Film
- Preparation of CU_9Al_4 Intermetallie Compound Films as a Metallization Material for LSI Technology
- Interfacial Solid-Phase Reaction in Al/HfN/Hf/Si Contact System during Postmetallization Annealing
- Auger Electron Spectroscopy Study on the Characterization and Stability of the Cu_9Al_4/TiN/Si System
- Formation Process and Electrical Property of IrO_2 Thin Films Prepared by Reactive Sputtering
- Preparation of Cu_Zr_7 Intermetallic Compound Film and Its Application as a Diffusion Barrier in Cu/Cu_Zr_7/ZrN/Si Contact System
- Epitaxial Growth of HfN Film and Sequential Single-Oriented Growth of Al/HfN Bilayered Film on (001) and (111) Si
- Microstructures and Hydrogen Permeability of Nb-Ti-Ni Alloys with High Resistance to Hydrogen Embrittlement
- Emergence of Hydrogen Absorption Ability in Metastable HCP, FCC and Amorphous Ti-Al Alloys Prepared by Mechanical Grinding
- Degradation of LaNi_5 and LaNi_ AI_ Hydrogen-Absorbing Alloys by Cycling
- Determination of Trace Levels of Selenium in Biological Samples by Graphite Furnace Atomic Absorption Spectrometry with a Solid Sampling Technique. Application of Pre-Ashing Concentration Technique
- HIGH PERFORMANCE REVERSED-PHASE LIQUID CHROMATOGRAPHY OF TRACE AMOUNTS OF INORGANIC AND ORGANIC MERCURY AS DIETHYLDITHIOCARBAMATE CHELATES
- Application of Al_3Hf/Hf Bilayered Film as a Diffusion Barrier to Al Metallization System of Si Large-Scale Integration
- Enhanced Catalytic Activity of Silica-Deposited Alumina for Selective Reduction of Nitrogen Monoxide by Ethene in Oxidizing Atmosphere
- Preparation of RhO2 Thin Films by Reactive Sputtering and Their Characterizations
- Electrical Properties of Amorphous Rh Oxide Thin Films Prepared by Reactive Sputtering
- Thermal Stability of RuO_2 Thin Films and Effects of Annealing Ambient on Their Reduction Process