スポンサーリンク
Department of Materials Engineering, Chungnam National University | 論文
- Bottom Electrode Structures of Pt/RuO_2/Ru on Polycrystalline Silicon for Low Temperature (Ba, Sr)TiO_3 Thin Film Deposition
- Bottom Electrode Structures of Pt/Ru Deposited on Polycrystalline Silicon for Semiconductor Memory Capacitors
- Bottom Electrode Structures of Pt/Ru Deposited on Polycrystalline Silicon for Semiconductor Memory Capacitors
- Bottom Electrode Structures of Pt/Ru Deposited on Polycrystalline Silicon for Semiconductor Memory Capacitors
- Ferroelectric Properties of SrBi_2Ta_2O_9 Thin Films Deposited on Various Bottom Electrodes by a Modified Radio-Frequency Magnetron Sputtering Technique
- Effect of Ni Doping on Improvement of the Tanability and Dielectric Loss of Ba_Sr_TiO_3 Thin Films for Microwave Thnable Devices : Electrical Properties of Condonsed Matter
- Phase Formations and Electrical Properties of Bi_La_Ti_3O_ and Sm-Doped Bi_La_Sm_Ti_3O_ Thin Films with Annealing Temperature
- Fabrication and Characterization of Ferroelectric-Gate Memory Devices Using (Bi, La)4Ti3O12/HfO2 Structure (先端デバイスの基礎と応用に関するアジアワークショップ)
- Fabrication and Characterization of Ferroelectric-Gate Memory Devices Using (Bi, La)_4 Ti_3O_/HfO_2 Structure (AWAD2003 (Asia-Pacific Workshop on Fundamental and Application of Advanced Semiconductor Devices))
- SrTa_2O_6 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition : Surfaces, Interfaces, and Films
- Growth and Characterization of (Ba_Sr_)TiO_3 Films Epitaxially Grown on (002) GaN/(0006) Al_2O_3 Electrode
- Influence of Narrow Transverse Slit in Ferroelectric Based Voltage Tunable Phase Shifter
- Improvement in Structural and Electrical Properties of (Ba_Sr_)TiO_3 Capacitors Using (Ba_Sr_)RuO_3 Conductive Layers at (Ba_Sr_)TiO_3/Pt Interface
- Effects of Chamber Pressure on Composition and Electrical Properties of Zr-Modified (Ba_ Sr_x)TiO_3 Thin Films Grown by Sputtering
- Characterization of Aluminum Nitride Thin Films on Silicon Substrates Grown by Plasma Assisted Molecular Beam Epitaxy
- Characteristics of Plasma-Sprayed Coatings Using Fine Al_2O_3Powder
- Improvement in Structural and Electrical Properties of (Ba0.5Sr0.5)TiO3 Capacitors Using (Ba0.5Sr0.5)RuO3 Conductive Layers at (Ba0.5Sr0.5)TiO3/Pt Interface