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Department of Graphic Engineering, Faculty of Engineering, Chiba University | 論文
- Photodegradable Toners for Electrophotography III. Accelerated Photodegradation and Suppressed Photocrosslinking of Matrix Resin-Their Dependence on Polymer Composition, UV-light Source, and Irradiation Conditions
- Conductance Switching Phenomena and H-Like Aggregates in Squarylium-Dye Langmuir-Blodgett Films : Surfaces, Interfaces, and Films
- A Surface-Silylated Single-Layer Resist Using Chemical Amplification for Deep Ultraviolet Lithography:II. Limited Permeation of Si Compounds from Liquid Phase^* : Instrumentation, Measurement, and Fabrication Technology
- Photodegradable Toners for Electrophotography II. Accelerated Photodegradation of Matrix Resin by Deep Ultraviolet-Exposure at an Elevated Temperature
- Enhancement of Dry-Etching Durabilities by Energy or Etchant Quenching with Aliphatic, Aromatic and Alicyclic Homopolymers, Polymer Blends and Copolymers
- Energy Quenching Effects on Dry-Etching Durability of Copolymers and Polymer Blends of Vinylnaphthalene or a-Methyl Styrene with Methyl Methacrylate
- Large Electric Conductance in the Interface Direction of Polar/Nonpolar Double-Layered Hetero-Langmuir-Blodgett Films
- Photodegradable Toners for Electrophotography I. Photodegradability of Matrix Resin
- Growth of Pb-Phthalocyanine Thin Films on MoS_2 Surfaces Studied by Means of Low-Energy Electron Transmission Spectroscopy
- Radiation Effect in Hexatriacontane Thin Film
- Mass Spectroscopy of Vaporized (SN)_x Polymer
- High-speed recovery of germanium in a convection-aided mode using functional porous hollow-fiber membranes
- Electron Affinities of Polystyrene and Poly(2-vinylpyridine) by Low-Energy Electron Inelastie Scattering
- Experimental Study of Conduction Band Structure of Some n-Alkanes and Polyethylene by Means of Low Energy Electron Scattering and Photoelectron Spectroscopy
- Dry-Etching Durability of Copolymers and Polymer Blends of Vinylnaphthalene or α-Methylstyrene with Methyl Methacrylate
- VUV-Assisted Etching of Silicon (100) and Poly(methyl methacrylate) : Semiconductors and Semiconductor Devices
- Direct Etching of Resists by UV Light
- Organic Bistable Memory Switching Phenomena in Squarylium-Dye Langmuir-Blodgett Films
- Energy Quenching Effects on Dry-Etching Durability of Alicyclic-Aliphatic Copolymers and Polymer Blends Enhanced by Polymer-Chain Entanglement
- Photosensitive Ionomer. IV. Preparation of Mercurous Copoly(vinyl alcohol-methacrylate) and Properties of the Plate