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Department of Electronics, Tokai University | 論文
- Radio-Frequency Downstream Plasma Production by Surface-Wave in a Very High-Permittivity Material Discharge Tube
- Surface Wave Plasma Production Employing High-Permittivity Discharge Tube for Material Processing
- A Study of Capacitively Coupled Plasma Generation in Single-Loop Antennas : Nuclear Science, Plasmas, and Electric Discharges
- Temperature Dependence of Electrical Conduction Mechanism in Amorphous Semiconductor
- In-Plane Orientation and Annealing Behavior of Rutile TiO_2 Films on MgO Substrate Prepared by Inductively Coupled Plasma-Assisted Sputtering
- An Interpretation of Transient Switching Process in Amorphous Films of As_Te_Ge_Si_
- Two-beam Irradiation Type Self-mixing Semiconductor Laser Doppler Velocimeter
- Sequence generation in arbitrary temporal patterns from theta-nested gamma oscillations : a model of the basal ganglia-thalamo-cortical loops
- Optical Absorption Measurements of Sputtered Titanium Ions in RF Magnetron Sputtering (Short Note)
- In-Plane Orientation and Annealing Behavior of Rutile TiO2 Films on MgO Substrate Prepared by Inductively Coupled Plasma-Assisted Sputtering
- Epitaxial Growth of Rutile TiO2 Films on MgO Substrate in Inductively Coupled Plasma-Assisted Sputtering