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Department of Electrical and Electronic Engineering, University of Miyazaki | 論文
- Plasma Surface Treatment of Carbonaceous Materials for Application in Electric Double Layer Capacitors
- Monitoring of an MgO Degradation in AC Plasma Display Panel Using Multivariate Analysis Method
- Experiments and Numerical Analyses of Charged Particle's Behavior in a Plasma Display Panel
- A Novel Sputter System with Dynamically Controlled Plasma
- Estimation of Position of On-line Partial Discharge on Hydrogenerator Stator Windings using Acoustic Emission Detection Techniques
- Localized Degradation of an MgO Layer in an Over-Frequency Accelerated Discharge of a Plasma Display Panel
- On-line Partial Discharge Measurement of Hydrogenerator Stator Windings using Acoustic Emission Detection Techniques
- On-line Partial Discharge Measurement of Hydrogenerator Stator Windings using Acoustic Emission Detection Techniques
- Studies of a Reactive Sputter Ion Plating for Preparation of TiN Films Using a Facing Target Sputter and Immersed Inductive Coupled Plasma Source
- Studies on Acoustic Emission Signals Detected in an Oil-immersed Pole Transformer
- Erasing Process of Thermally Poled Optical Nonlinearities in Silica Glasses with KrF Excimer Laser Pulses
- Ultrasoft X-Ray Emission Spectroscopic Analysis for Effects of Vacuum Ultraviolet Rare Gas Excimer Laser Irradiation on Silicon Nitride Films
- Hot Ion Beam Generation from Rare-Gas Cryogenic Targets
- Investigation of the Conditions Required for the Forlnation of a Magnetic Neutral Loop Discharge Plasma : Nuclear Science, Plasmas, and Electric Discharges
- Characteristics of the copper vapour from electrode material in a pseudo vacuum circuit breaker under DC discharge using laser induced flourescence
- Application of Thermal Analysis for Clarification of Degradation Characteristics of Silicone Rubber Exposed to Partial Arc Discharge
- Studies of Elastic Waves in Ethylene Propylene Rubber Using Acoustic Emission Sensor
- Piezoelectric Photothermal Study of the Optical Absorption Spectra of Microcrystalline Silicon
- Amorphous Silicon Film Deposition from SiH_4 by Chemical Vapor Deposition with Argon Excimer Lamp
- Analysis of the Photochemical Reaction on the Surface for Room Temperature Deposition of SiO_2 Thin Films by Photo-CVD using Vacuum Ultraviolet Light