スポンサーリンク
Department of Electrical and Electronic Engineering, Tokyo University of Agriculture and Technology, Koganei, Tokyo 184-8588, Japan | 論文
- Magnetization Switching of Magnetic Submicron Structure Fabricated by Atomic Force Microscope
- AFM Nano-oxidation of NiFe Thin Films Capped with Al-Oxide Layers for Planar-type Tunnel Junction
- InGaP/GaAs Heterojunction Bipolar Transistors with an Ultra-High Carbon-Doped Base (p=1.5×10^cm^)
- Low Temperature Growth of Heavily Carbon-Doped GaAs by Metalorganic Molecular Beam Epitaxy with Elemental Gallium
- P-Type Carbon-Doped InGaAs Grown by Metalorganic Molecular Beam Epitaxy
- Serum interleukin-6 response after spinal surgery : estimation of surgical magnitude
- Atomic-Scale Depth Profiling of Oxides/Si(111) and Oxynitrides/Si(100) Interface
- Electric Conductivity and Proton Motion below Superionic Transition on Rb_3H(SeO_4)_2
- Proton Motion in Paraelastic Phase for Rb_3H (SeO_4)_2
- Lumbar Paraspinal Myonecrosis After Abdominal Vascular Surgery : A Case Report
- 2005-Research development of giant magnetostrictive Sm-Fe alloy films
- Influences of Process Condition of Magnetron Sputtering on Magnetostrictive Susceptibility of Fe_Sm Alloy Film
- Scratch Nanolithography on Si Surface Using Scanning Probe Microscopy: Influence of Scanning Parameters on Groove Size
- Demonstration of a Magnetically Controllable Fabry--Perot Laser and an Unidirectional Ring Laser Utilizing a Nonreciprocal Semiconductor Optical Amplifier
- Percutaneous vertebroplasty for vertebral pseudoarthrosis with delayed palsy
- Reduced Threshold Current and Enhanced Extinction Ratio in a Magnetically Controllable Fe50Co50--InGaAlAs/InP Nonreciprocal Semiconductor Laser
- Measurement of Reaction Current during Atomic Force Microscope Local Oxidation of Conductive Surfaces Capped with Insulating Layers
- Generation of Radiation Pressure in Thermally Induced Ultrasonic Emitter Based on Nanocrystalline Silicon
- Magneto-Optical Properties and Size Effect of Ferromagnetic Metal Nanoparticles
- Sub-20 nm Scratch Nanolithography for Si Using Scanning Probe Microscopy