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Department of Computer Science, Kyonggi University | 論文
- Highly Anisotropic Etching of Tungsten-Nitride for an X-Ray Mask Absorber with an Inductively Coupled Plasma System
- Analysis of Multilayer Structure for Reflection of Extreme-Ultraviolet Wavelength
- Effects of SF_6 Addition to O_2 Plasma on Polyimide Etching
- Study on the Properties of Interlayer Low Dielectric Polyimide during Cl-Based Plasma Etching of Aluminum
- High Transmittance SiC Membrane Prepared by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition in Combination with Rapid Thermal Annealing
- Effect of Attenuated Phase Shift Mask Structure on Extreme Ultraviolet Lithography
- Characteristics of Pentacene Organic Field-Effect Transistors with Self-Assembled-Monolayer-Treated HfO2 Gate Oxide
- Resistance Switching Characteristics for Nonvolatile Memory Operation of Binary Metal Oxides
- Electrical Properties of Atomic Layer Deposited HfO2 Gate Dielectric Film Using D2O as Oxidant for Improved Reliability
- Effect on Critical Dimension Performance for Carbon Contamination of Extreme Ultraviolet Mask Using Coherent Scattering Microscopy and In-situ Contamination System
- Nanosize Patterning with Nanoimprint Lithography Using Poly(vinyl alcohol) Transfer Layer
- Structural Characterization of a Mo/Ru/Si Extreme Ultraviolet (EUV) Reflector by Optical Modeling
- Numerical Investigation of Defect Printability in Extreme Ultraviolet (EUV) Reflector: Ru/Mo/Si Multilayer System
- Device Performance and Reliability of P-Channel Metal-Oxide-Semiconductor Field Effect Transistors with Chemical-Vapor-Deposited Gate Oxides
- On Reducing Rollback Propagation Effect of Optimistic Message Logging for Group-Based Distributed Systems