スポンサーリンク
Department Of Materials Science The University Of Tokyo | 論文
- Growth of Large Grained Silicon on Insulator by Electron Beam Annealing and Performance of MOS Devices : A-6: SILICON CRYSTALS
- Effects of 0.4%Si and 0.02%P Additions on Surface Hot Shortness in 0.1%C-0.5%Mn Steels Containing 0.5% Cu
- Evaluation of Susceptibility to Surface Hot Shortness in Cu-containing Steels by Tensile Test
- Novel Micropaterned Surface Fabricated from Heterobifunctional Poly(ethylene glycol)/polylactide Block Copolymers for Patterned Cell Culture
- An atmospheric-pressure microplasma jet source for the optical emission spectroscopic analysis of liquid sample
- Localized and ultrahigh-rate etching of silicon wafers using atmospheric-pressure microplasma jets
- Phase Transformation from Amorphous Phase to New Approximant Phase of Icosahedral Quasicrystal in Boron-Carbon System
- Etching Reactivity of Negative Ions Generated in Cl_2 Downstream Plasma
- A New Inside-Type Segmented Coil Antenna for Uniformity Control in a Large-Area Inductively Coupled Plasma
- Localized Removal of a Photoresist by Atmospheric Pressure Micro-plasma Jet Using RF Corona Discharge
- Electrical Conductivity, Magnetic Susceptibility and Thermoelectric Power for Li, Cu and Al Doped β-rhombohedral B Related to f.c.c. C_
- Adnexal torsion of mature cystic teratoma with hemorrhagic infarction : helpful findings on successive plain abdominal radiographs
- Imaging of a single atomic column in silicon grain boundary
- Grain Boundary Sliding and Atomic Structures in Alumina Bicrystals with [0001] Symmetric Tilt Grain Boundaries
- Si Etch Rate and Etch Yield with Ar^+/Cl_2 System
- Effect of GeO_2 and NdO_ Co-doping on High-temperature Ductility in TZP
- Characteristics of Very High-Aspect-Ratio Contact Hole Etching
- Photoexcited Anisotropic Etching of Single-Crystalline Silicon
- FFTF-CYCLE 10 PROGRAM AND FUTURE PLAN
- TENSILE PROPERTIES OF JPCA AND JFMS IRRADIATED IN JMTR BY MEANS OF MINIATURIZED SPECIMEN TESTING