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Department Of Electronic Engineering And Institute Of Electronics National Chiao Tung University And | 論文
- Reactive Ion Pretreatment Technique to Improve the Ashing Resistance of Low Dielectric Constant High Carbon Content Polymer
- Comprehensive Study of Plasma Pretreatment Process for Thin Gate Oxide (< 10 nm) Fabricated by Electron Cyclotron Resonance Plasma Oxidation
- A Simple and Efficient Pretreatment Technology for Selective Tungsten Deposition in Low-Pressure Chemical Vapor Deposition Reactor
- Activity Coefficients of Electrons and Holes in Degenerate Semiconductors with Nonuniform Composition
- Thermal Stability of Amorphous-like WN_x/W Bilayered Diffusion Barrier for Chemical Vapor Deposited-Tungsten/p^+-Si Contact System
- Suppression of Fluorine Impurity in Blanket Chemical Vapor Deposited Tungsten Film for Via Fills with A Novel Two-step Deposition Technique
- Influence of Sheet Resistance on N_2O-Grown Polyoxide
- The Characteristics of Chemical Vapor Deposited Amorphous-like Tungsten Film as a Gate Electrode
- Using NH_3 Plasma Pretreatment to Improve the Characteristics of Organic Spin-on Low-k nlaterials for Copper Metallization : Instrumentation, Measurement, and Fabrication Technology
- Characteristics of Zirconium Oxide Gate Ion-Sensitive Field-Effect Transistors