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Central Research Laboratory, Hitachi, Ltd | 論文
- Tunable Interference of Andreev-Reflected Quasi-Particle Wave Functions in Mesoscopic Superconductor/Semiconductor Structures
- Elementary Cellular Automaton Actions in a RF-Superconducting Quantum Interference Device Network
- Experiments on Space-Division Multiplexing of Electron Waves in a Solid Using Andreev Reflection at the Si/Nb Boundary
- Light Detection by Superconducting Weak Link Fabricated with High-Critical-Temperature Oxide-Superconductor Film
- Electron Beam Direct Writing Technology for 64-Mb DRAM LSIs : Lithography Technology
- Electron Beam Direct Writing Technology for 64-Mb DRAM LSIs
- A Low-Power Embedded RISC Microprocessor with an Integrated DSP for Mobile Applications(Special Issue on High-Performance and Low-Power Microprocessors)
- DC-SQUID with High-Critical-Temperature Oxide-Superconductor Film
- EDTV-II識別制御信号の検討: EDTV技術および一般 : 放送方式
- Novel Alignment Method for Planarized Substrates in Electron Beam Lithography
- Mechanism of Radiation Damage in SiO_2/Si Induced by vuv Photons : Beam-Induced Physics and Chemistry
- Mechanism of Radiation Damage in SiO_2/Si Induced by vuv Photons
- Neutral-Beam-Assisted Etching of SiO_2 : A Charge-Free Etching Process
- Analysis of Boron Penetration and Gate Depletion Using Dual-Gate PMOSFETs for High Performance G-Bit DRAM Design(Special Issue on Microelectronic Test Structures)
- Single Crystal Growth of Layered Perovskite Metal Oxides
- Fabrication of Deep Sub-μm Narrow-Channel Si-MOSFET's with Twofold-Gate Structures : Microfabrication and Physics
- High Resolution X-Ray Elemental Mapping Using 300-kV Field-Emission TEM
- Micromachining and Device Transplantation Using Focused Ion Beam : Etching and Deposition Technology
- Micromachining and Device Transplantation Using Focused Ion Beam
- Proposal for Device Transplantation using a Focused Ion Beam