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Assoc. Super‐advanced Electronics Technol. (aset) Kanagawa Jpn | 論文
- Thermal Stability of a RuO_2 Electrode Prepared by DC Reactive Sputtering
- Hydrogen Reduction Properties of RuO_2 Electrodes
- Excimer Laser Ablation of Polymeric Materials Containing Phenyl Amide Unit
- Polyurethane Resins as Resist Materials for Excimer Ablation Lithography(EAL)
- Performance of X-Ray Stepper for Next-Generation Lithography
- Consideration of Silylation Contrast in an ArF Liquid-Phase Silylation Process
- High Output Power Operation of a 1.3 μm Gain-Coupled Distributed Feedback Laser with Narrow Spectral Linewidth
- Analysis of Decomposed Layer Appearing on the Surface of Barium Strontium Titanate
- Effects of Post-Annealing Temperatures and Ambient Atmospheres on the Electrical Properties of Ultrathin (Ba, Sr) TiO_3 Capacitors
- High Resolution Measurement of Excimer Laser Beam Profile by Using Resist Film
- New Low-Temperature Processing of Metalorganic Chemical Vapor Deposition-Bi_4Ti_3O_ Thin Films Using BiO_x Buffer Layer
- New Low Temperature Processing of MOCVD-Bi_4Ti_3O_ Thin Films Using BiO_x Buffer Layer
- High Resolution Transmission Electron Microscopy of Defects in High T_c Superconductor Ba_2YCu_3O_y
- A Structural Defect of Natural Magnetite Observed in an Electron Microscope Lattice Image
- Preparation of PbZrO_3 -PbTiO_3 -Pb(Mg_Nb_)O_3 Thick Films by Screen Printing
- Determination of Uranium and Thorium in Aluminum by Inductively Coupled Plasma Mass Spectrometry
- Evaluation of Ultratrace Metallic Impurities in Thin Copper Layers, Barrier Metals and Silicon Wafers for Copper Metallization Technology