Polyurethane Resins as Resist Materials for Excimer Ablation Lithography(EAL)

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概要

• 論文の詳細を見る
• Technical Association of Photopolymers, Japanの論文

著者

• Hayashi N

  Hitachi Ltd. Chiba Jpn

• Suzuki K

  Assoc. Super‐advanced Electronics Technol. (aset) Kanagawa Jpn

関連論文

• Excimer Laser Ablation of Polymeric Materials Containing Phenyl Amide Unit
• Polyurethane Resins as Resist Materials for Excimer Ablation Lithography(EAL)
• High Resolution Measurement of Excimer Laser Beam Profile by Using Resist Film

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