Nakamura Ryo | Fujitsu Ltd., 50 Fuchigami, Akiruno, Tokyo 197-0833, Japan
スポンサーリンク
概要
関連著者
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KAWAMURA Kazuo
Fujitsu Laboratories Ltd.
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Saiki Takashi
Fujitsu Limited Advanced Lsi Development Div.
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Nakamura Ryo
Fujitsu Ltd., 50 Fuchigami, Akiruno, Tokyo 197-0833, Japan
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KATAOKA Yuji
Fujitsu Laboratories Ltd.
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KASE Masataka
Fujitsu Ltd.
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Kawamura Kazuo
Fujitsu Ltd., Fuchigami 50, Akiruno, Tokyo 197-0833, Japan
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Kawamura Kazuo
Fujitsu Ltd., 50 Fuchigami, Akiruno, Tokyo 197-0833, Japan
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Inagaki Satoshi
Fujitsu Ltd., 50 Fuchigami, Akiruno, Tokyo 197-0833, Japan
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Saiki Takashi
Fujitsu Ltd., Fuchigami 50, Akiruno, Tokyo 197-0833, Japan
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Kataoka Yuji
Fujitsu Laboratories, 10-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0197, Japan
著作論文
- Dependence of Sheet Resistance of CoSi2 with Gate Length of 30 nm on Thickness of Titanium Nitride Capping Layer in Co-Salicide Process
- Dependence of CoSi2 Sheet Resistance on Cobalt Thickness for Gate Lengths of 50 nm or Less