Seo Yong-Jin | Department of Electrical and Electronic Engineering, Daebul University, 72 Sanhoi, Samho, Youngam, Chonnam-do 526-702, Korea
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概要
- Seo Yong-Jinの詳細を見る
- 同名の論文著者
- Department of Electrical and Electronic Engineering, Daebul University, 72 Sanhoi, Samho, Youngam, Chonnam-do 526-702, Koreaの論文著者
関連著者
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Seo Yong-Jin
Department of Electrical and Electronic Engineering, Daebul University, 72 Sanhoi, Samho, Youngam, Chonnam-do 526-702, Korea
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Seo Yong-jin
Department Of Electrical And Electronics Engineering Daebul University
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SEO Yong-Jin
Department of Electrical Engineering, DAEBUL University
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Kim Sang-yong
Fab Division Anam Semiconductor Co. Inc.
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LEE Woo-Sun
Department of Electrical Engineering, CHOSUN University
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Seo Yong-jin
Department Of Electrical Engineering Daebul University
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Seo Yong-Jin
Department of Electrical Engineering, Daebul University, Chonnam-do 526-702, Korea
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Park Jin-seong
Department Of Advanced Materials Engineering Chosun University
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TSU Raphael
Department of Electrical Engineering, University of North Carolina at Charlotte
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KIM Kil-Ho
Technology & Product Development Center, MagnaChip Semiconductor Ltd.
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Kim Kil-ho
Technology & Product Development Center Magnachip Semiconductor Ltd.
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Tsu Raphael
Department Of Electrical Engineering University Of North Carolina At Charlotte
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Kim Sang-Yong
FAB Division, ANAM Semiconductor Co., Inc., Kyounggi-do 420-130, Korea
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Lee Woo-Sun
Department of Electrical Engineering, CHOSUN University, Kwang-Ju 501-759, Korea
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Lee Woo-Sun
Department of Electrical Engineering, Chosun University, Gwangju 501-759, Korea
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Kim Nam-Hoon
Research Institute of Energy Resources Technology, Chosun University, Gwangju 501-759, Korea
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Kim Kil-Ho
Korea Design Center, Leadis Technology, Inc., Kyungki-do 463-954, Korea
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Park Jin-Seong
Department of New Material Engineering, CHOSUN University, Kwang-Ju 501-759, Korea
著作論文
- Electronic and Optical Characteristics of Multilayer Nanocrystalline Silicon/Adsorbed Oxygen Superlattice : Semiconductors
- Effects of Various Facility Factors on Chemical Mechanical Polishing Process Defects
- N-Type Extended Drain Silicon Controlled Rectifier ESD Protection Device with High Latchup Immunity for High Voltage Operating I/O Application
- N-Type Extended Drain Silicon Controlled Rectifier Electrostatic Discharge Protection Device for High-Voltage Operating Input/Output Applications
- Effects of Silica Slurry Temperature on Chemical Mechanical Polishing for Tetraethyl Orthosilicate Film
- Motor-Current-Based Real-Time End Point Detection of Shallow-Trench-Isolation Chemical Mechanical Polishing Process Using High-Selectivity Slurry