Yokoyama H. | Nanoelectronics Research Institute Aist

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概要

• YOKOYAMA H.の詳細を見る
• 同名の論文著者
• Nanoelectronics Research Institute Aistの論文著者

関連著者

• Matsukawa T.

  Nanoelectronics Research Institiute Aist

• Matsukawa T.

  Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology

• Yamauchi H.

  Nanoelectronics Research Institiute Aist

• Yokoyama H.

  Nanoelectronics Research Institute Aist

• MASAHARA M.

  National Institute of Advanced Industrial Science and Technology (AIST)

• Masahara M.

  Nanoelectronics Research Institiute Aist

• Suzuki E.

  Nanoelectronics Research Institiute Aist

• Endo K.

  Nanoelectronics Research Institiute Aist

• Liu Y.-x.

  Nanoelectronics Research Institiute Aist

• ENDO K.

  Nanoelectronics Research Institiute, AIST

• MASAHARA M.

  Nanoelectronics Research Institiute, AIST

• YAMAUCHI H.

  Nanoelectronics Research Institiute, AIST

• TSUKADA J.

  Nanoelectronics Research Institiute, AIST

• SUZUKI E.

  Nanoelectronics Research Institiute, AIST

• Liu Y.

  National Laboratory Of Solid State Microstructrues And Department Of Physics Nanjing University

• Kanemaru S.

  Nanoelectronics Research Institute Aist

• MATSUKAWA T.

  National Institute of Advanced Industrial Science and Technology (AIST)

• ENDO K.

  National Institute of Advanced Industrial Science and Technology (AIST)

• ISHII K.

  National Institute of Advanced Industrial Science and Technology (AIST)

• YAMAUCHI H.

  National Institute of Advanced Industrial Science and Technology (AIST)

• SUZUKI E.

  National Institute of Advanced Industrial Science and Technology (AIST)

• LIU Y.

  Nanoelectronics Research Institiute, AIST

• ISHII K.

  Nanoelectronics Research Institiute, AIST

• Takashima H.

  School Of Science And Technology Meiji University

• Tsukada J.

  Nanoelectronics Research Institiute Aist

• Ishikawa Y.

  National Cardiovascular Center

• Yasumuro C.

  Nanoelectronics Research Institute Aist

• HAYASHIDA T.

  School of Science and Technology, Meiji University

• SAKAMOTO K.

  National Institute of Advanced Industrial Science and Technology (AIST)

• TSUKADA J.

  National Institute of Advanced Industrial Science and Technology (AIST)

• OGURA A.

  School of Science and Technology, Meiji University

• ISHIKAWA Y.

  Nanoelectronics Research Institiute, AIST

• SUGIMATA E.

  National Institute of Advanced Industrial Science and Technology (AIST)

• TAKASHIMA H.

  National Institute of Advanced Industrial Science and Technology (AIST)

• ITOH J.

  Nanoelectronics Research Institute, AIST

• MATSUKAWA T.

  Electrotechnical Laboratory

• FUJII H.

  Materials Research Laboratory, Kobe Steel, LTD.

• KANEMARU S.

  Electrotechnical Laboratory

• NAGAO M.

  Electrotechnical Laboratory

• YOKOYAMA H.

  Electrotechnical Laboratory

• ITOH J.

  Electrotechnical Laboratory

• O'uchi S.

  National Institute Of Advanced Industrial Science And Technology (aist)

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著作論文

• TiN Gate Work Function Control Using Nitrogen Gas Flow Ratio and RTA-Temperature
• Dual Metal Gate MOSFETs with Symmetrical Threshold Voltages Using Work Function Tuned Ta/Mo Bi-layer Metal Gates
• Ta/Mo Stack Dual Metal Gate Technology Applicable to Gate-First Processes
• Carrier Mobility in Multi-FinFETs with a (111) Channel Surface Fabricated by Orientation-Dependent Wet Etching
• Work function control of Al-Ni alloy for metal gate application
• Charging Damage of SOI Wafer Diagnosed by Scanning Maxwell-Stress Microscopy

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