Umezawa T | Teijin Ltd. Hiroshima Jpn
スポンサーリンク
概要
関連著者
-
UMEZAWA Tomokazu
Faculty of Science and Technology,Keio University
-
Umezawa T
Teijin Ltd. Hiroshima Jpn
-
Noya Atsushi
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
-
Sasaki Katsutaka
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
-
UMEZAWA Toshiji
Department of Electronic Engineering, Faculcy of Engineering, Kitami Institute of Technology
-
Yoshiko H.
Faculty of Science and Engineering,Keio University
-
FUKUCHI Mitsuru
Faculty of Science and Engineering,Keio University
-
OHASHI Kazutoshi
Faculty of Engineering,Tamagawa University
-
Fukuchi M
Department Of Instrumentation Engineering Faculty Of Science And Technology Keio University
-
Fukuchi Mitsuru
Department Of Instrumentation Engineering Faculty Of Science & Technology Keio University
-
Fukuchi Mitsuru
Keio University
-
Fukuchi M
Keio Univ. Kanagawa
-
OHASHI Yoshiko
Department of Instrumentation Engineering,Faculty of Science and Technology,Keio University
-
OYAMA Masanori
Department of Electronics,Tokyo National College of Technology
-
KATO Makio
Department of Electronics,Tokyo National College of Technology
-
Yoshiko H.
Department Of Instrumentation Engineering Faculty Of Science And Technology Keio University
-
Ohashi Yoshiko
Faculty Of Engineering Keio University
-
Kato Makio
Department Of Electrical Engineering Tokyo National College Of Technology
-
Kato Makio
Department Of Electronics Tokyo National College Of Technology
-
Oyama Masanori
Department Of Electronics Tokyo National College Of Technology
-
Ohashi K
Department Of Electrical And Electronic Engineering Faculty Of Engineering Okayama University
-
Ohashi Kazutoshi
Faculty Of Engineering Tamagawa University
著作論文
- Effects of Oxygen Impurity and of Heat-Treatment on Thermal Diffusivity of Sputtered SiC Film
- Stoichiometry of Ta-N Film and Its Application for Diffusion Barrier in the Al_3Ta/Ta-N/Si Contact System
- Interaction of Al_3Ta Intermetallic Compound Film with Si : Surfaces, Interfaces and Films
- Preparation and Characterizations of Al_3Ta Intermetallic Compound Films : Surfaces, Interfaces and Films