Loong Wen-an | Institute Of Applied Chemistry National Chiao Tung University
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概要
関連著者
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Loong Wen-an
Institute Of Applied Chemistry National Chiao Tung University
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Yeh Kwei-tin
Institute of Applied Chemistry, National Chiao Tung University, 1001 Ta-Hsueh Road, Hsinchu 300, Taiwan, Republic of China
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LOONG Wen-An
Institute of Applied Chemistry, National Chiao Tung University
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Hu Ji-ren
Institute of Applied Chemistry, National Chiao Tung University, 1001 Ta-Hsueh Road, Hsinchu 300, Taiwan, Republic of China
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Lin Chih-hung
Institute of Applied Chemistry, National Chiao Tung University, 1001 Ta-Hsueh Road, Hsinchu 300, Taiwan, Republic of China
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Loong Wen-an
Institute of Applied Chemistry, National Chiao Tung University, 1001 Ta-Hsueh Road, Hsinchu 300, Taiwan, Republic of China
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Loong W‐a
National Chiao Tung Univ. Hsin‐chu Twn
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Chang Hong-long
Institute Of Applied Chemistry National Chiao Tung University
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PENG Nien-tsu
Institute of Applied Chemistry, National Chiao Tung University
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Lin Cheng-ming
Institute Of Applied Chemistry National Chiao Tung University
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Peng Nien-tsu
Institute Of Applied Chemistry National Chiao Tung University
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Lin Hsien-yun
Institute of Applied Chemistry, National Chiao Tung University, 1001 Ta-Hsueh Road, Hsinchu 300, Taiwan, Republic of China
著作論文
- AlSi_xO_y as a High-Transmittance Embedded Material of Ternary Attenuated Phase-Shifting Mask and Correlation between Chemical Composition and Optical Properties of AlSi_xO_y in 193nm Lithography
- Oxidation of GaAs Surface by Oxygen Plasma and Its Application as an Antireflection Layer
- keV Ion-Beam-Exposed Poly(methylisopropenylketone) and Poly(phenylisopropenylketone)
- Modified Reflectance–Transmittance Method for the Metrology of Thin Film Optical Properties
- Simulation for Optimization of Mask Error Enhancement Factor by Design of Experiments in Both Dry and Immersion ArF Lithography
- Simulations of Mask Error Enhancement Factor in 193 nm Immersion Lithography
- Simulation of Applications of High-Transmittance Embedded Layer in Transmittance Control Mask and Optimization of Attenuated Phase-Shifting Mask by Design of Experiment