Modified Reflectance–Transmittance Method for the Metrology of Thin Film Optical Properties
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概要
- 論文の詳細を見る
Because the surface roughness of a thin film will cause light scattering, the reflectance (R) and transmittance (T) measured using a UV/visible (vis) spectrometer become lower than the actual values. The deviation becomes larger with increasing roughness and decreasing wavelength of incident light. Hence, it is necessary to correct measured R and T using roughness as a modification factor. The refraction ($n$) and extinction coefficient ($k$) obtained by the modified R–T method are closer to those results obtained using a variable angle spectroscopic ellipsometer (VASE), which provides more precise results than a $n$ and $k$ analyzer.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2006-03-15
著者
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Loong Wen-an
Institute Of Applied Chemistry National Chiao Tung University
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Hu Ji-ren
Institute of Applied Chemistry, National Chiao Tung University, 1001 Ta-Hsueh Road, Hsinchu 300, Taiwan, Republic of China
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Yeh Kwei-tin
Institute of Applied Chemistry, National Chiao Tung University, 1001 Ta-Hsueh Road, Hsinchu 300, Taiwan, Republic of China
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Lin Chih-hung
Institute of Applied Chemistry, National Chiao Tung University, 1001 Ta-Hsueh Road, Hsinchu 300, Taiwan, Republic of China
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Loong Wen-an
Institute of Applied Chemistry, National Chiao Tung University, 1001 Ta-Hsueh Road, Hsinchu 300, Taiwan, Republic of China
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