Toh Katsuaki | Institute Of Applied Physics University Of Tsukuba
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概要
関連著者
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Toh Katsuaki
Institute Of Applied Physics University Of Tsukuba
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SUEMASU Takashi
Institlite of Materials Science, University of Tsukuba
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Usami Noritaka
Institute For Material Research Tohoku University
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Saito Takanobu
Institute For Materials Research
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Suemasu Takashi
Institute Of Applied Physics University Of Tsukuba
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USAMI Noritaka
Institute for Materials Research, Tokoku University
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Usami Noritaka
Institute Of Materials Research Tohoku University
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SUEMASU Takashi
Institute of Applied Physics, University of Tsukuba
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OKADA Atsushi
Institute of Applied Physics, University of Tsukuba
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SAITO Takanobu
Institute of Applied Physics, University of Tsukuba
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TOH Katsuaki
Institute of Applied Physics, University of Tsukuba
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Khan M.
Institute of Applied Physics, University of Tsukuba
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Okada Atsushi
Institute Of Applied Physics University Of Tsukuba
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Saito Takanobu
Institute Of Applied Physics University Of Tsukuba
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Khan M.
Institute Of Applied Physics University Of Tsukuba
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Toh Katsuaki
Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan
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Hara Kosuke
Institute for Materials Research, Tohoku University, Sendai 980-8577, Japan
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Saito Noriyuki
Electron Microscope Facility, IBEC Innovation Platform, AIST, Tsukuba, Ibaraki 305-8569, Japan
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Yoshizawa Noriko
Electron Microscope Facility, IBEC Innovation Platform, AIST, Tsukuba, Ibaraki 305-8569, Japan
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Toko Kaoru
Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan
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Suemasu Takashi
Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan
著作論文
- Toward high-efficiency thin-film solar cells using semiconducting BaSi_2(Session 1A : Emerging Device Technology 1)
- Toward high-efficiency thin-film solar cells using semiconducting BaSi_2(Session 1A : Emerging Device Technology 1)
- Epitaxy of Orthorhombic BaSi2 with Preferential In-Plane Crystal Orientation on Si(001): Effects of Vicinal Substrate and Annealing Temperature
- Optical Absorption Properties of BaSi2 Epitaxial Films Grown on a Transparent Silicon-on-Insulator Substrate Using Molecular Beam Epitaxy