Yoshizawa Noriko | Electron Microscope Facility, IBEC Innovation Platform, AIST, Tsukuba, Ibaraki 305-8569, Japan

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概要

• Yoshizawa Norikoの詳細を見る
• 同名の論文著者
• Electron Microscope Facility, IBEC Innovation Platform, AIST, Tsukuba, Ibaraki 305-8569, Japanの論文著者

関連著者

• Usami Noritaka

  Institute For Material Research Tohoku University

• Saito Noriyuki

  Electron Microscope Facility, IBEC Innovation Platform, AIST, Tsukuba, Ibaraki 305-8569, Japan

• Yoshizawa Noriko

  Electron Microscope Facility, IBEC Innovation Platform, AIST, Tsukuba, Ibaraki 305-8569, Japan

• Toko Kaoru

  Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan

• SUEMASU Takashi

  Institlite of Materials Science, University of Tsukuba

• Toh Katsuaki

  Institute Of Applied Physics University Of Tsukuba

• Suemasu Takashi

  Institute Of Applied Physics University Of Tsukuba

• Khan M.

  Institute Of Applied Physics University Of Tsukuba

• Toh Katsuaki

  Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan

• Hara Kosuke

  Institute for Materials Research, Tohoku University, Sendai 980-8577, Japan

• Suemasu Takashi

  Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan

• Nakamura Kotaro

  Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan

• Baba Masakazu

  Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan

• Du Weijie

  Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan

• Koike Shintaro

  Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan

• Khan M.

  Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan

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著作論文

• Molecular Beam Epitaxy of BaSi2 Films with Grain Size over 4 μm on Si(111)
• Epitaxy of Orthorhombic BaSi2 with Preferential In-Plane Crystal Orientation on Si(001): Effects of Vicinal Substrate and Annealing Temperature

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