Hata Masahiko | Tsukuba Research Laboratory Sumitomo Chemical Co. Ltd.
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概要
関連著者
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Hata Masahiko
Tsukuba Research Laboratory Sumitomo Chemical Co. Ltd.
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Hata Masahiko
Tsukuba Material Development Laboratory, Sumitomo Chemical Co., Ltd., Tsukuba, Ibaraki 300-3294, Japan
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SHIMIZU Mitsuaki
National Institute of Advance Industrial Science and Technology (AIST), Power Electronics Research C
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Yamada Hisashi
Tsukuba Research Laboratory, Sumitomo Chemical Co., Ltd., 6 Kitahara, Tsukuba, Ibaraki 300-3294, Japan
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Sazawa Hiroyuki
Tsukuba Material Development Laboratory, Sumitomo Chemical Co., Ltd., Tsukuba, Ibaraki 300-3294, Japan
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SAKURAI Takeaki
Institute of Scientific and Industrial Research, Osaka University
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OKUMURA Hajime
National Institute of Advance Industrial Science and Technology (AIST), Power Electronics Research C
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Shimizu Mitsuaki
National Institute Of Advanced Industrial Science And Technology
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IDE Toshihide
National Institute of Advanced Industrial Science and Technology (AIST)
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SAZAWA Hiroyuki
Tsukuba Research Laboratory, Sumitomo Chemical Co., Ltd.
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HONDA Yoshiaki
Tsukuba Research Laboratory, Sumitomo Chemical Co., Ltd.
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HATA Masahiko
Tsukuba Research Laboratory, Sumitomo Chemical Co., Ltd.
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HASEGAWA Akira
Tsukuba Research Laboratory, Sumitomo Chemical Co., Ltd.
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HAMAMATSU Hiroshi
Tsukuba Research Laboratory, Sumitomo Chemical Co., Ltd.
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AKIMOTO Katsuhiko
Institute of Applied Physics, University of Tsukuba
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Okumura Hajime
National Inst. Of Advanced Sci. And Technol. Ibaraki Jpn
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Honda Yoshiaki
Tsukuba Research Laboratory Sumitomo Chemical Co. Ltd.
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Nakayama Masaaki
Department Of Applied Physics Faculty Of Engineering Osaka City University
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Takeuchi Hideo
Department Of Applied Physics Faculty Of Engineering Osaka City University
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Yanagisawa Junichi
Department Of Electrical Engineering Faculty Of Engineering Science Osaka University
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Hamamatsu Hiroshi
Tsukuba Research Laboratory Sumitomo Chemical Co. Ltd.
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Sakurai Takeaki
Institute Of Applied Physics University Of Tsukuba
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Fukuhara Noboru
Tsukuba Research Laboratory, Sumitomo Chemical Co., Ltd., 6 Kitahara, Tsukuba, Ibaraki 300-3294, Japan
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Yanagisawa Junichi
Department of Electronic Systems Engineering, School of Engineering, The University of Shiga Prefecture, 2500 Hassaka-cho, Hikone, Shiga 522-8533, Japan
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Nakayama Masaaki
Department of Applied Physics, Graduate School of Engineering, Osaka City University, 3-3-138 Sugimoto, Sumiyoshi-ku, Osaka 558-8585, Japan
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Tsuruta Syuuichi
Department of Applied Physics, Graduate School of Engineering, Osaka City University, 3-3-138 Sugimoto, Sumiyoshi-ku, Osaka 558-8585, Japan
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Hata Masahiko
Tsukuba Research Laboratory, Sumitomo Chemical Co., Ltd., 6 Kitahara, Tsukuba, Ibaraki 300-3294, Japan
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Yamamoto Taiki
Tsukuba Material Development Laboratory, Sumitomo Chemical Co., Ltd., Tsukuba, Ibaraki 300-3294, Japan
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Ide Toshihide
National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki 300-1295, Japan
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Nishikawa Naohiro
Tsukuba Material Development Laboratory, Sumitomo Chemical Co., Ltd., Tsukuba, Ibaraki 300-3294, Japan
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Kiuchi Maki
National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki 300-1295, Japan
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Inoue Takayuki
Tsukuba Material Development Laboratory, Sumitomo Chemical Co., Ltd., Tsukuba, Ibaraki 300-3294, Japan
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Shimizu Mitsuaki
National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki 300-1295, Japan
著作論文
- Improved Contact Resistance in AlGaN/GaN Heterostructures by Titanium Distribution Control at the Metal-Semiconductor Interface
- Frequency Shift of Terahertz Electromagnetic Waves Originating from Sub-Picosecond-Range Carrier Transport in Undoped GaAs/n-Type GaAs Epitaxial Layer Structures
- The Effect of n-GaAs Carrier Concentration on Current Gain in InGaP/GaAs Heterojunction Bipolar Transistors
- Reduction in Buffer Leakage Current with Mn-Doped GaN Buffer Layer Grown by Metal Organic Chemical Vapor Deposition