Kojima Mamoru | Hitachi Semiconductor And Ic Division

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概要

• 同名の論文著者
• Hitachi Semiconductor And Ic Divisionの論文著者

関連著者

• Kojima Mamoru

  Hitachi Semiconductor And Ic Division

• Tada T

  Analytical Research Laboratories Fujisawa Pharmaceutical Co. Ltd.

• Tokunaga Takashi

  Advanced Technology R&d Center Mitsubishi Electric Corporation

• Matsui M

  Central Research Laboratory Asahi Chemical Industry Co. Ltd.

• Matsui Miyako

  Hitachi Ltd. Central Research Laboratory

• UCHIDA Fumihiko

  Hitachi Central Research Laboratory, Hitachi, Ltd.

• TOKUNAGA Takafumi

  Hitachi Device Development Center

• Kojima Masayuki

  Hitachi Semiconductor and IC Division, 5-20-1 Jyousui-honcho, Kodaira-shi, Tokyo 187, Japan

• Katsuyama Kiyomi

  Hitachi Device Development Center, 2326 Imai-cho, Ome-shi, Tokyo 198, Japan

• Katsuyama K

  Sumitomo Electric Ind. Ltd. Yokohama Jpn

• Uchida F

  Aoyama Gakuin Univ. Tokyo Jpn

• Katsuyama Kiyomi

  Hitachi Device Development Center

• Kojima Masayuki

  Hitachi Semiconductor and IC Division

• Tokunaga Takashi

  Mitsubishi Electric Corp

• 山田 弘司

  核融合科学研究所

• Narihara K

  National Institute For Fusion Science

• 森崎 友宏

  National Institute for Fusion Science

• KAWAHATA Kazuo

  National Insitute for Fusion Science

• MINAMI Takashi

  National Insitute for Fusion Science

• NARIHARA Kazumichi

  National Insitute for Fusion Science

• YAMADA Ichihiro

  National Insitute for Fusion Science

• 山田 啓文

  京都大学工学研究科電子工学専攻

• Kawamura K

  Tokai University

• Kawahata K

  Nifs

• Yamada Ichihiro

  National Institute For Fusion Science

• Sato Kohnosuke

  Dept. Of Energy Engineering And Science Nagoya University

• Sato Kohnosuke

  National Institute For Fusion Science

• Minami T

  National Institute For Fusion Science

• Hamada Y

  Nagoya Municipal Industrial Res. Inst. Nagoya Jpn

• KOJIMA Mamoru

  National Institute for Fusion Science

• HAMADA Yasuji

  National Institute for Fusion Science

• YAMAUCHI Kenji

  National Institute for Fusion Science

• HIROKURA Satoru

  National Institute for Fusion Science

• Mutoh Takashi

  Plasma Physics Laboratory Kyoto University

• Yamauchi Kenji

  National Insitute For Fusion Science

• Yamada I

  Univ. Hyogo Hyogo Jpn

• Arai Hiromasa

  Hitachi Semiconductor And Ic Division

• Yamazaki Kazuo

  Hitachi Semiconductor and IC Division, 5-20-1 Jyousui-honcho, Kodaira-shi, Tokyo 187, Japan

• Yamazaki Kazuo

  Hitachi Semiconductor And Ic Division

• 中村 一男

  Research Institute for Applied Mechanics, Kyushu University

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著作論文

• Construction of a 100-Hz-Repetition-Rate 28-Channel Thomson Scattering System for the JIPPT-IIU Tokamak
• In-situ After-treatment Using Low-energy Dry-etching with a CF4/O2 Gas Mixture to Remove Reactive Ion Etching Damage
• Using Auger Electron Spectroscopy for Chemical Analysis of Plasma Damage Induced by Reactive Ion Etching of SiO_2
• Low-energy Ion Scattering Measurement of Near-surface Damage Induced by the SiO_2 Dry-Etching Process

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