Tokunaga Takashi | Mitsubishi Electric Corp
スポンサーリンク
概要
関連著者
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Tokunaga Takashi
Mitsubishi Electric Corp
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Tada T
Analytical Research Laboratories Fujisawa Pharmaceutical Co. Ltd.
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Tokunaga Takashi
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Fujii Y
Research Laboratory For Nuclear Reactors Tokyo Institute Of Technology
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Yamada Kazushi
Department Of Polymer Science And Engineering Kyoto Institute Of Technology
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Yamada Keiichi
Department Of Electrical Engineering Hiroshima University
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Yamada Koichi
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Fujii Yoshihisa
Faculty Of Engineering Hiroshima University
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Tokunaga Takashi
Mitsubishi Electric Corporation
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山田 顕
東北学院大院工
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FUJII Yoshio
Advanced Technology R&D Center, Mitsubishi Electric Corporation
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NAKAKI Yoshiyuki
Mitsubishi Electric Corporation
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Matsui M
Central Research Laboratory Asahi Chemical Industry Co. Ltd.
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Matsui Miyako
Hitachi Ltd. Central Research Laboratory
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UCHIDA Fumihiko
Hitachi Central Research Laboratory, Hitachi, Ltd.
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TOKUNAGA Takafumi
Hitachi Device Development Center
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Tokunaga Takashi
Advanced Technology R & D Center Mitsubishi Electric Corporation
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Uchida F
Aoyama Gakuin Univ. Tokyo Jpn
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山田 顕
東北学院大 工
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Yamada Kohji
NTT Atsugi Electrical Communication Laboratories
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山田 顕
東北大学工学部
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Kawano Y
Graduate School Of Engineering Nagoya University
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FUKAMI Tatsuya
Mitsubishi Electric Corporation
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KAWANO Yuji
Mitsubishi Electric Corporation
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TSUTSUMI Kazuhiko
Mitsubishi Electric Corporation
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Kojima Mamoru
Hitachi Semiconductor And Ic Division
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Tsutsumi K
Otsuka Pharmaceutical Fac. Inc. Tokushima Jpn
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Kojima Masayuki
Hitachi Semiconductor and IC Division, 5-20-1 Jyousui-honcho, Kodaira-shi, Tokyo 187, Japan
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Katsuyama Kiyomi
Hitachi Device Development Center, 2326 Imai-cho, Ome-shi, Tokyo 198, Japan
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Katsuyama K
Sumitomo Electric Ind. Ltd. Yokohama Jpn
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Katsuyama Kiyomi
Hitachi Device Development Center
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Kojima Masayuki
Hitachi Semiconductor and IC Division
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Furukawa Teruo
Hiroshima Institute Of Technology
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Yamada Koichi
Mitsubishi Electric Corp
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OSHIMA Hiroki
Department of Materials Engineering, The University of Tokyo
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Muramatsu Daisuke
Department Of Information Engineering Teikyo Heisei University
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Enomoto Hiroyuki
Hitachi Device Development Center
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Oshima Hiroki
Department Of Information Engineering Teikyo Heisei University
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UMEZAWA Tadashi
Hitachi Device Development Center
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TANAKA Kunimaro
Department of Information Engineering, Teikyo Heisei University
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MURAKAMI Lyuichiro
Department of Information Engineering, Teikyo Heisei University
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KURIHARA Yutaka
Department of Information Engineering, Teikyo Heisei University
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Kurihara Yutaka
Department Of Information Engineering Teikyo Heisei University
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Kurihara Y
Teikyo Heisei Univ. Chiba Jpn
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Tsutsumi Kazuhiko
Materials Engineering Laboratory Mitsubishi Electric Co.
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FUKAMI Tatsuya
Materials and Electronic Devices Laboratory, Mitsubishi Electric Corp.
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NAKAKI Yoshiyuki
Materials and Electronic Devices Laboratory, Mitsubishi Electric Corp.
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TOKUNAGA Takashi
Materials and Electronic Devices Laboratory, Mitsubishi Electric Corp.
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TAGUCHI Motohisa
Materials and Electronic Devices Laboratory, Mitsubishi Electric Corp.
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SUGAHARA Hiroshi
Materials and Electronic Devices Laboratory, Mitsubishi Electric Corp.
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Taguchi Motohisa
Materials And Electronic Devices Laboratory Mitsubishi Electric Corp.
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Murakami Lyuichiro
Department Of Information Engineering Teikyo Heisei University
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Tanaka Kunimaro
Department Of Information Engineering Teikyo Heisei University
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Sugahara Hiroshi
Materials And Electronic Devices Laboratory Mitsubishi Electric Corp.
著作論文
- Domain Expansion Phenomena in Exchange-Coupled Multilayer Magneto-Optical Films
- Edge Recording on Direct Overwrite Exchange-Coupled Multilayer Media : Media
- Edge Recording on Direct Overwrite Exchange-Coupled Multilayer Media
- Low-energy Ion-scattering Spectroscopic Analysis of Structural Damage in Si Substrate under Ultrathin SiO_2 after Gate Etching
- Multilevel Recording with Multilayer Magneto Optical Media by Light Intensity Modulation
- Magnetic Domain Expansion Phenomena in a Double Mask Type Magnetically Induced Super Resolution Magneto-Optical Disk
- Using Auger Electron Spectroscopy for Chemical Analysis of Plasma Damage Induced by Reactive Ion Etching of SiO_2
- Low-energy Ion Scattering Measurement of Near-surface Damage Induced by the SiO_2 Dry-Etching Process
- Direct Overwrite Magneto-Optical Disks with Double Mask Type Magnetically Induced Super Resolution
- A New Direct Overwrite Method by Light Intensity Modulation with Multi Layered Magneto-Optical Discs