Gomi H | Nec Corp. Kanagawa Jpn

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著作論文

A 0.7-μm-Pitch Double Level Al Interconnection Technology for 1-Gbit DRAMs using SiO_2 Mask Al Etching and Plasma Enhanced Chemical Vapor Deposition SiOF
A Reliable Double Level Interconnection Technology for Giga Bit DRAMs Using SiO_2 Mask Al Etching and PECVD SiOF
Surface micromorphology of columnar ice crystals growing in air at high and low supersaturations
Growth forms and growth mechanisms of single snow crystals growing at a low temperature

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