KAWAMOTO Hideaki | ULSI Device Development Laboratories, NEC Corporation

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概要

• KAWAMOTO Hideakiの詳細を見る
• 同名の論文著者
• ULSI Device Development Laboratories, NEC Corporationの論文著者

関連著者

• 上野 啓司

  埼玉大理

• Yamada Y

  Department Of Quantum Science And Energy Engineering Tohoku University

• Kishimoto Koji

  Ulsi Device Development Laboratories Nec Corporation

• Yoshida Y

  Department Of Energy Engineering And Science Nagoya University

• Yamada Y

  Akita Univ. Akita Jpn

• Yamada Yuh

  National Research Institute For Metals

• Yokoyama Toshifumi

  Storage Media Systems Development Center Matsushita Electric Industrial Co. Ltd.

• Kishimoto K

  Nec Corp. Kanagawa Jpn

• YOKOYAMA Takashi

  ULSI Device Development Laboratories, NEC Corporation

• YAMADA Yoshiaki

  VLSI Manufacturing Engineering Division, NEC Corporation

• USAMI Tatsuya

  ULSI Device Development Laboratories, NEC Corporation

• KAWAMOTO Hideaki

  ULSI Device Development Laboratories, NEC Corporation

• UENO Kazuyoshi

  ULSI Device Development Laboratories, NEC Corporation

• GOMI Hideki

  ULSI Device Development Laboratories, NEC Corporation

• Yokoyama T

  Storage Media Systems Development Center Matsushita Electric Industrial Co. Ltd.

• Gomi H

  Nec Corp. Kanagawa Jpn

• Gomi Hideki

  Ulsi Device Development Laboratories Nec Corporation

• Usami Tatsuya

  Ulsi Device Development Laboratories Nec Corporation

• Kawamoto Hideaki

  Ulsi Device Development Laboratories Nec Corporation

• Yokoyama T

  Tokai Univ. Kanagawa Jpn

• Yokoyama Takashi

  Ulsi Device Development Division Nec Corporation

• Yokoyama Yoshihiko

  Superconductivity Research Laboratory, International Superconductivity Technology Center

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著作論文

• A 0.7-μm-Pitch Double Level Al Interconnection Technology for 1-Gbit DRAMs using SiO_2 Mask Al Etching and Plasma Enhanced Chemical Vapor Deposition SiOF

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